Tunnel FETs for low power electronics

A. Vandooren, A. Alian, A. Verhulst, J. Franco, R. Rooyackers, Q. Smets, D. Verreck, N. Waldron, D. Mocuta, N. Collaert
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引用次数: 1

Abstract

We report on Tunnel Field-Effect Transistors for low power electronics. Thanks to their potential to reach sub-60mV/dec subthreshold slope, these devices are very attractive for use in circuits with sub-0.5V supply voltage. However, proper device design as well as material choice is not obvious and many implementations have shown larger slope than expected, due to parasitic trap-assisted tunneling conduction. We review work done at imec on tunnelFETs. Initial work was based on vertical nanowire structures using goup-IV semiconductor materials. More recently, implementation of TunnelFETS on III-V materials using a Zn-diffusion approach for source doping was demonstrated with an attractive slope below 60mV/dec. Trap-assisted tunneling is extracted from the devices characteristics based on the activation energy of different conduction mechanisms present in the devices.
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用于低功率电子器件的隧道场效应管
本文报道了用于低功耗电子器件的隧道场效应晶体管。由于它们具有达到低于60mv /dec的亚阈值斜率的潜力,这些器件非常适合用于低于0.5 v电源电压的电路。然而,适当的器件设计和材料选择并不明显,并且由于寄生陷阱辅助隧道传导,许多实现显示出比预期更大的斜率。我们对隧道场效应管的工作进行了回顾。最初的工作是基于使用第四组半导体材料的垂直纳米线结构。最近,在III-V材料上使用zn扩散方法进行源掺杂的tunnelfts的实现被证明具有低于60mV/dec的诱人斜率。陷阱辅助隧穿是根据器件中存在的不同传导机制的活化能从器件特性中提取出来的。
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