A. Vandooren, A. Alian, A. Verhulst, J. Franco, R. Rooyackers, Q. Smets, D. Verreck, N. Waldron, D. Mocuta, N. Collaert
{"title":"Tunnel FETs for low power electronics","authors":"A. Vandooren, A. Alian, A. Verhulst, J. Franco, R. Rooyackers, Q. Smets, D. Verreck, N. Waldron, D. Mocuta, N. Collaert","doi":"10.1109/S3S.2016.7804386","DOIUrl":null,"url":null,"abstract":"We report on Tunnel Field-Effect Transistors for low power electronics. Thanks to their potential to reach sub-60mV/dec subthreshold slope, these devices are very attractive for use in circuits with sub-0.5V supply voltage. However, proper device design as well as material choice is not obvious and many implementations have shown larger slope than expected, due to parasitic trap-assisted tunneling conduction. We review work done at imec on tunnelFETs. Initial work was based on vertical nanowire structures using goup-IV semiconductor materials. More recently, implementation of TunnelFETS on III-V materials using a Zn-diffusion approach for source doping was demonstrated with an attractive slope below 60mV/dec. Trap-assisted tunneling is extracted from the devices characteristics based on the activation energy of different conduction mechanisms present in the devices.","PeriodicalId":145660,"journal":{"name":"2016 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","volume":"52 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/S3S.2016.7804386","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
We report on Tunnel Field-Effect Transistors for low power electronics. Thanks to their potential to reach sub-60mV/dec subthreshold slope, these devices are very attractive for use in circuits with sub-0.5V supply voltage. However, proper device design as well as material choice is not obvious and many implementations have shown larger slope than expected, due to parasitic trap-assisted tunneling conduction. We review work done at imec on tunnelFETs. Initial work was based on vertical nanowire structures using goup-IV semiconductor materials. More recently, implementation of TunnelFETS on III-V materials using a Zn-diffusion approach for source doping was demonstrated with an attractive slope below 60mV/dec. Trap-assisted tunneling is extracted from the devices characteristics based on the activation energy of different conduction mechanisms present in the devices.