M. Modreanu, P. Cosmin, S. Cosmin, C. Cobianu, C. Dunare
{"title":"Measurement of CVD thin films thickness by sample weighing method","authors":"M. Modreanu, P. Cosmin, S. Cosmin, C. Cobianu, C. Dunare","doi":"10.1109/SMICND.1996.557407","DOIUrl":null,"url":null,"abstract":"Several type of films obtained by the Chemical Vapour Deposition technique, such as silicon dioxide, phosphosilicate glass, silicon oxynitride, silicon nitride and polysilicon, were investigated. A calibration technique for the sample weighing method comprising film density evaluation was developed. The sample weighing method was found to be a fast, precise and non-destructive method for thin film thickness evaluation.","PeriodicalId":266178,"journal":{"name":"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings","volume":"80 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.1996.557407","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
Several type of films obtained by the Chemical Vapour Deposition technique, such as silicon dioxide, phosphosilicate glass, silicon oxynitride, silicon nitride and polysilicon, were investigated. A calibration technique for the sample weighing method comprising film density evaluation was developed. The sample weighing method was found to be a fast, precise and non-destructive method for thin film thickness evaluation.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
