Analysis of defect maps of large area VLSI ICs

I. Koren, Z. Koren, C. Stapper
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引用次数: 3

Abstract

Defect maps of 57 wafers containing large area VLSI ICs were analyzed in order to find a good match between the empirical distribution of defects and a theoretical model. The main result is that the commonly employed models, most notably, the large area clustering negative binomial distribution, do not provide a sufficiently good match for these large area ICs. Even the recently proposed medium size clustering model, although closer to the empirical distribution than other known distributions, is not good enough. To obtain a good match, either a combination of two theoretical distributions or a 'censoring' procedure (i.e. ignoring the worst chips) is necessary.<>
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大面积VLSI集成电路缺陷图分析
分析了57片含大面积VLSI集成电路晶圆的缺陷图,发现缺陷的经验分布与理论模型之间有很好的匹配。主要结果是,常用的模型,最明显的是大面积聚类负二项分布,不能为这些大面积集成电路提供足够好的匹配。即使是最近提出的中等大小的聚类模型,虽然比其他已知的分布更接近经验分布,但也不够好。为了获得良好的匹配,要么结合两个理论分布,要么进行“审查”程序(即忽略最差的芯片)是必要的。
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