Bondability and challenges of Cu ultra-fine-wire bonding

S. Sutiono, Zhang Xi, T. C. Wei, Don Syth An, M. Sarangapani, Louie Huang, Jason Hung, F. Lin
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引用次数: 1

Abstract

Cu wire bonding has matured much over the years with improvements made not only to the Cu bonding process and optimization methodologies from bonder manufacturers, but also on capillaries and Cu wire itself. It is also part of the roadmap of many assembly houses to include ultra-fine-pitch(UFP) Cu wire applications. In this paper, various Cu wire types including coated Cu going down to as fine as 0.5mil diameter size is evaluated and compared in terms of Free-Air-Ball(FAB), 2nd bond performance in a customized QFP leadframe, 1st bond performance in a customized BGA substrate and extreme looping conditions at high and ultra-low loop are studied too. Challenges faced in Cu ultra-fine-wire(UFW) application will also be discussed. Improvement process through wire bonding parameters and making use of wire characteristics will also be covered. As wire diameter gets smaller, energy that is required to melt wire to form FAB also gets lower. Range of energy input in term of EFO Current and Firing Time also get smaller, and might be more sensitive towards noises from surrounding. Shorter Firing Time might also means less time to form concentric sphere before freezing. EFO firing approach gets more critical in this sense. Unlike gold wire that is malleable, copper wire is harder and hence does not deformed as easily. Limited by smaller capillary tip in UFP, 2nd bond contact area at UFW bonding also gets smaller. 2nd bond approach with segmented bonding was used to enhance the 2nd bond contact in this evaluation. UFP application with bond pad pitch down to as small as 30um has been reported in gold wire, however due to Cu FAB's harder nature, presence of Al splash in 1st bond posed a greater challenge in achieving this pitch with similar wire size made with Cu. Ease of bondability of CuPd has created a tendency to run CuPd wire as plug and playable wire to existing bare Cu wires. However difference observed in bonding response of CuPd from bare Cu means that slight fine tuning in looping such as the kink location might still be required.
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铜超细丝键合性能及挑战
多年来,随着铜键合工艺和键合剂制造商的优化方法的改进,铜线键合技术已经成熟,而且毛细血管和铜线本身也得到了改进。它也是许多装配厂路线图的一部分,包括超细间距(UFP)铜线应用。本文从自由空气球(FAB)、定制QFP引线框架的二次键合性能、定制BGA衬底的一次键合性能以及高回路和超低回路的极端回路条件等方面对各种铜线类型进行了评估和比较,其中包括细至0.5mil直径的涂层铜线。此外,还将讨论铜超细丝(UFW)应用面临的挑战。通过线材粘合参数和线材特性的改进过程也将被介绍。线材直径越小,熔化线材形成FAB所需的能量也越低。EFO电流和发射时间的能量输入范围也变得更小,并且可能对周围的噪声更敏感。更短的燃烧时间也可能意味着更少的时间在冻结前形成同心圆。EFO发射方法在这个意义上更加关键。与具有延展性的金线不同,铜线较硬,因此不容易变形。由于UFP中毛细管尖端较小,UFW键合的第二键接触面积也变小。在本次评估中,采用了分段键的二键方法来增强二键的接触。据报道,在金线中,结合垫间距小至30um的UFP应用,但是由于铜FAB的硬度,在第一键中存在Al飞溅,这对用铜制成的类似尺寸的线实现这种间距提出了更大的挑战。cud的易粘合性创造了将cud线作为插入和可玩线运行到现有裸铜线的趋势。然而,在cud与裸Cu的键合响应中观察到的差异意味着可能仍然需要对环路进行轻微的微调,例如扭结位置。
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