SRAM Physical Failure Analysis Challenges in Technology Nodes Beyond 14 nm

Noor Jehan Saujauddin, Kevin Davidson, Esther P.Y. Chen
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Abstract

Three case studies involving 14 nm SRAM technology show how progressive FIB cross-sectioning and top-down analysis can be supplemented with nanoprobing and TEM tomography to determine the root cause of failure. In the first case, the memory failure is traced to an abnormal gate profile. In the second case, the failure is attributed to a metal line short, and in the third case, a gate defect.
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14纳米以上技术节点的SRAM物理失效分析挑战
涉及14纳米SRAM技术的三个案例研究表明,渐进FIB横切面和自上而下的分析可以与纳米探测和TEM断层扫描相补充,以确定故障的根本原因。在第一种情况下,内存故障可以追溯到异常的门配置文件。在第二种情况下,故障是由于金属线短,而在第三种情况下,是栅极缺陷。
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