Simultaneous measuring the resistivity and permeability of a film sample with double coils

Y. Nonaka, H. Nakane, T. Maeda, K. Hasuike
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引用次数: 2

Abstract

A method is proposed for a simultaneous measurement of the resistivity and permeability of a film by measuring the difference in the composite impedance of a pair of coils placed on both sides of the sample film facing each other. In first case, the current passes through the coils in the same direction and in second case, the current passes through the coils in opposite directions to each other. It was theoretically found that the optimum frequency for the measurement was proportional to the resistivity and inversely proportional to the thickness of a sample film in the case of paramagnetic films. This method was tested by measuring the resistivity of copper and brass films of a thickness ranging from 0.01 to 0.08 mm, and by simultaneously measuring the resistivity and permeability of nickel films of a thickness of 0.01 and 0.02 mm. The measured values of the resistivity with this method have correlated well with the values measured with the dc four-point probe method.<>
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用双线圈同时测量薄膜样品的电阻率和磁导率
提出了一种同时测量薄膜电阻率和磁导率的方法,即测量放置在样品膜两侧的一对线圈的复合阻抗差。在第一种情况下,电流以相同的方向通过线圈,在第二种情况下,电流以相反的方向通过线圈。理论上发现,在顺磁性薄膜的情况下,测量的最佳频率与电阻率成正比,与样品膜的厚度成反比。通过测量厚度为0.01 ~ 0.08 mm的铜和黄铜薄膜的电阻率,以及同时测量厚度为0.01 ~ 0.02 mm的镍薄膜的电阻率和磁导率,对该方法进行了验证。用这种方法测得的电阻率值与用直流四点探头法测得的值有很好的相关性
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