J. Cai, T. Ning, C. D'Emic, J. Yau, K. Chan, J. Yoon, K. Jenkins, R. Muralidhar, D. Park
{"title":"SOI lateral bipolar transistor with drive current >3mA/μm","authors":"J. Cai, T. Ning, C. D'Emic, J. Yau, K. Chan, J. Yoon, K. Jenkins, R. Muralidhar, D. Park","doi":"10.1109/S3S.2013.6716518","DOIUrl":null,"url":null,"abstract":"Record-high drive current on the order of 3-5mA/μm is demonstrated in lateral silicon bipolar transistors on SOI. This is achieved by scaling quasi-neutral base width to below 10nm. The heavily doped collector enables the transistor to operate in high level injection regime without the detrimental base push-out effect. Measured cut-off frequency is the highest for a lateral bipolar and has a broad peak, confirming its immunity to base push-out. Functional complementary bipolar ring oscillator operating in the full saturation region is reported for the first time. The salient features of CMOS-compatible process and design, high current drive capability and low voltage bipolar logic present exciting opportunities for lateral SOI bipolar to complement CMOS.","PeriodicalId":219932,"journal":{"name":"2013 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","volume":"134 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/S3S.2013.6716518","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9
Abstract
Record-high drive current on the order of 3-5mA/μm is demonstrated in lateral silicon bipolar transistors on SOI. This is achieved by scaling quasi-neutral base width to below 10nm. The heavily doped collector enables the transistor to operate in high level injection regime without the detrimental base push-out effect. Measured cut-off frequency is the highest for a lateral bipolar and has a broad peak, confirming its immunity to base push-out. Functional complementary bipolar ring oscillator operating in the full saturation region is reported for the first time. The salient features of CMOS-compatible process and design, high current drive capability and low voltage bipolar logic present exciting opportunities for lateral SOI bipolar to complement CMOS.