Ferroelectric Ultra High-Density Data Storage Based on Scanning Nonlinear Dielectric Microscopy

Yasuo Cho, S. Hashimoto, N. Odagawa, K. Tanaka, Y. Hiranaga
{"title":"Ferroelectric Ultra High-Density Data Storage Based on Scanning Nonlinear Dielectric Microscopy","authors":"Yasuo Cho, S. Hashimoto, N. Odagawa, K. Tanaka, Y. Hiranaga","doi":"10.1109/NVMT.2006.378872","DOIUrl":null,"url":null,"abstract":"Nano-sized inverted domain dots in ferroelectric materials have potential application in ultrahigh-density rewritable data storage systems. Herein, a data storage system is presented based on scanning non-linear dielectric microscopy and a thin film of ferroelectric single-crystal lithium tantalite. Through domain engineering, we succeeded to form an smallest artificial nano-domain single dot of 5.1 nm in diameter and artificial nano-domain dot-array with a memory density of 10.1 Tbit/inch2 and a bit spacing of 8.0 nm, representing the highest memory density for rewritable data storage reported to date. Sub-nanosecond (500 psec) domain switching speed also has been achieved. Next, long term retention characteristic of data with inverted domain dots is investigated by conducting heat treatment test. Obtained life time of inverted dot with the radius of 50 nm was 16.9 years at 80degC. Finally, actual information storage with low bit error and high memory density was performed. A bit error ratio of less than 1times 10-4 was achieved at an areal density of 258 Gbit/inch2. Moreover, actual information storage is demonstrated at a density of 1 Tbit/inch2.","PeriodicalId":263387,"journal":{"name":"2006 7th Annual Non-Volatile Memory Technology Symposium","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 7th Annual Non-Volatile Memory Technology Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NVMT.2006.378872","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Nano-sized inverted domain dots in ferroelectric materials have potential application in ultrahigh-density rewritable data storage systems. Herein, a data storage system is presented based on scanning non-linear dielectric microscopy and a thin film of ferroelectric single-crystal lithium tantalite. Through domain engineering, we succeeded to form an smallest artificial nano-domain single dot of 5.1 nm in diameter and artificial nano-domain dot-array with a memory density of 10.1 Tbit/inch2 and a bit spacing of 8.0 nm, representing the highest memory density for rewritable data storage reported to date. Sub-nanosecond (500 psec) domain switching speed also has been achieved. Next, long term retention characteristic of data with inverted domain dots is investigated by conducting heat treatment test. Obtained life time of inverted dot with the radius of 50 nm was 16.9 years at 80degC. Finally, actual information storage with low bit error and high memory density was performed. A bit error ratio of less than 1times 10-4 was achieved at an areal density of 258 Gbit/inch2. Moreover, actual information storage is demonstrated at a density of 1 Tbit/inch2.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
基于扫描非线性介电显微镜的铁电超高密度数据存储
铁电材料的纳米倒畴点在超高密度可重写数据存储系统中具有潜在的应用前景。本文提出了一种基于扫描非线性介电显微镜和铁电单晶钽酸锂薄膜的数据存储系统。通过领域工程,我们成功构建了直径为5.1 nm的最小人工纳米域单点和存储密度为10.1 Tbit/inch2、位间距为8.0 nm的人工纳米域点阵列,代表了迄今为止报道的可重写数据存储的最高存储密度。亚纳秒(500 psec)的域切换速度也已实现。其次,通过热处理试验,研究了倒域点数据的长期保留特性。得到半径为50 nm的倒立点在80℃下的寿命为16.9年。最后,实现了低误码、高存储密度的实际信息存储。在面密度为258 Gbit/inch2时,实现了小于1倍10-4的误码率。此外,实际的信息存储密度为1 tbbit /inch2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Unique Challenges and Solutions in CMOS Compatible NVM A Low Power Non-Volatile Memory Element Based on Copper in Deposited Silicon Oxide Switching Properties in Spin Transper Torque MRAM with sub-5Onm MTJ size A New Self-Aligned NAND Type SONOS Flash Memory with High Scaling Abilities, Fast Programming/Erase Speeds and Good Data Retention Performances A 4-Mbit Non-Volatile Chalcogenide-Random Access Memory Designed for Space Applications
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1