Investigation of Factors Affecting SET-Disturb Failure Time in a Resistive Switching Memory

P. Su, Y. T. Chung, M. C. Chen, Tahui Wang
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引用次数: 2

Abstract

Factors affecting SET-disturb failure time (τf) in a tungsten oxide resistive switching memory including SET/RESET cycling stress, resistance window in operation and SET-disturb voltage are investigated. A SET-disturb failure time in high resistance state (HRS) may degrade by orders of magnitude in a post-cycling cell. The degradation is attributed to the formation of a current percolation path of cycling stress-generated traps. A one-dimensional percolation model is proposed for the τf degradation. The dependence of τf on resistance window in operation is characterized. We find that τf is greatly affected by the current level of LRS. The strong LRS dependence of τf is attributed to a small Weibull slope of τf. In addition, we perform statistical characterizations of τf at different SET-disturb voltages. A relationship between τf and a SET-disturb voltage in a stressed cell is given.
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研究了影响氧化钨阻性开关存储器中SET/RESET循环应力、工作电阻窗口和SET-disturb电压等因素对SET- RESET失效时间τf的影响。在循环后的电池中,高阻状态(HRS)的set干扰失效时间可能会降低几个数量级。这种降解是由于形成了循环应力生成的圈闭的电流渗透路径。提出了τf退化的一维渗流模型。研究了τf在运行过程中对阻力窗的依赖性。我们发现τf受当前LRS水平的影响很大。τf的强LRS依赖性归因于τf的小威布尔斜率。此外,我们还对不同干扰电压下的τf进行了统计表征。给出了应力单元中扰动电压τf与扰动电压之间的关系。
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