Large signal pulsed RF and DC load pull characterization of high voltage 10W GaAs-GaInP HBTs

T. Gasseling, S. Heckmann, D. Barataud, J. Nebus, J. Villotte, R. Quéré, D. Floriot, P. Auxemery
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引用次数: 8

Abstract

This paper presents an on-wafer set up for the characterization of high voltage (26V) power HBTs under simultaneous large pulsed RF signal and pulsed DC test conditions. Both RF power profiles and DC current/voltage profiles are measured thanks to the use of a pulsed VNA (for RF) and a sampling scope (for DC). Typically the pulse width range is (300 ns - 300 ms) and a 10% duty cycle is applied. RF power performances and DC consumption of the transistors under test are recorded at different time positions within the pulse width This enables to investigate the effects of transient thermal aspects on RF power characteristics. S Band Measurements of 10 Watt (20 finger 2*70mm/sup 2/ GaAs-GaInP HBTs from Thales; TRT and UMS foundry) with specific gold radiator are reported in this paper.
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高电压10W GaAs-GaInP HBTs的大信号脉冲射频和直流负载拉特性
本文介绍了一种同时在大脉冲射频信号和脉冲直流测试条件下表征高压(26V)功率hbt的晶上装置。由于使用了脉冲VNA(用于RF)和采样示波器(用于DC),可以测量RF功率曲线和DC电流/电压曲线。典型的脉冲宽度范围为(300纳秒- 300毫秒),占空比为10%。在脉冲宽度内的不同时间位置记录被测晶体管的射频功率性能和直流功耗,从而可以研究瞬态热方面对射频功率特性的影响。S波段测量10瓦(20指2*70mm/sup 2/ Thales GaAs-GaInP HBTs;本文报道了专用金散热器的TRT和UMS铸造。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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