High Performance MWIR InAsSb-based nBn Photodetectors

Maryam Shaveisi, P. Aliparast
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Abstract

Today with increasing the operating temperatures, obtaining the ability to reduce the dark current of MWIR photodetectors is obligated. In this paper, structures are considered based on InAsSb with Sb composition, xSb=0.17 as absorber layers with various barrier semiconductors to indicate the importance of using these nBnn structures in medical applications. We evaluate the impressive physical factors such as doping density of barrier layer and the applied bias voltage on the performance of these photodetectors to achieve two structures with desirable physical properties. Detailed analysis of barrier doping density confirms that n- type doping density ND<1xl014 cm−3 leads to valence band offset of less than 20 meV and makes it possible to estimate the high sensitivity of the proposed nBnn photodetectors. Also, the simulation results show that both structures have 92% and 99%, respectively reduction in dark current compared to the previous best structure.
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高性能MWIR inassb基nBn光电探测器
在工作温度不断提高的今天,获得降低MWIR光电探测器暗电流的能力是必须的。在本文中,考虑了基于含有Sb成分,xSb=0.17的InAsSb结构作为各种阻挡半导体的吸收层,以表明使用这些nBnn结构在医疗应用中的重要性。我们评估了令人印象深刻的物理因素,如阻挡层的掺杂密度和施加的偏置电压对这些光电探测器性能的影响,以获得具有理想物理性能的两种结构。对势垒掺杂密度的详细分析证实,n型掺杂密度ND< 1x1014 cm−3导致价带偏移小于20 meV,从而可以估计所提出的nBnn光电探测器的高灵敏度。仿真结果表明,两种结构的暗电流分别比之前的最佳结构降低了92%和99%。
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