Effect of Proton Irradiation Energy on AlGaN/GaN HEMTs fabricated by Ion-implanted Isolation

Dong‐Seok Kim, Jun-Hyeok Lee, Jeong-Gil Kim, J. S. Lee, Jung-Hee Lee
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Abstract

We evaluated the effect of the proton irradiation energy on electrical properties of AlGaN/GaN high electron mobility transistors (HEMTs) fabricated by Ar + ion-implanted isolation. The HEMTs were exposed to various irradiation energies - 0.5 MeV, 5 MeV, and 60 MeV, respectively, with a fluence of $1\times 10^{14}$ p/cm2, at room temperature. The proton radiation-induced degradation of HEMTs was occurred by the displacement damage effect, which is directly related to the nonionizing energy loss (NIEL). The saturation drain current of 0.5 MeV-irradiated HEMT has more severely degraded than that of 60 MeV-irradiated HEMT because the lower proton energy has the larger NIEL. The threshold voltage of HEMTs with proton irradiation is usually positively shifted due to the reduction of 2-dimensional electron gas (2DEG) density by defects created during irradiation, however, the 60 MeV-irradiated HEMT showed the negative threshold voltage shift, which is discrepant from reported results.
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质子辐照能量对离子注入分离制备AlGaN/GaN hemt的影响
研究了质子辐照能量对氩离子注入隔离制备的AlGaN/GaN高电子迁移率晶体管(HEMTs)电学性能的影响。在室温下,hemt分别受到0.5 MeV、5 MeV和60 MeV的辐照,影响值为$1\乘以10^{14}$ p/cm2。质子辐射诱导的HEMTs降解是通过位移损伤效应发生的,而位移损伤效应与非电离能损失(NIEL)直接相关。0.5 mev辐照HEMT的饱和漏极电流比60 mev辐照HEMT的衰减更严重,因为质子能量越低,NIEL越大。质子辐照下HEMT的阈值电压通常为正移,这是由于辐照过程中产生的缺陷使二维电子气密度(2DEG)降低,但60 mev辐照下HEMT的阈值电压为负移,这与报道的结果不同。
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