85 fs RON×COFF and CP1dB@28GHz > 25dBm Innovative PIN Diode Integrated in 55 nm BiCMOS Technology Targeting mmW 5G and 6G Front End Module

O. Foissey, F. Gianesello, V. Gidel, C. Durand, A. Gauthier, N. Guitard, P. Chevalier, M. Hello, J. A. Gonçalves, D. Gloria, V. Velayudhan, J. Lugo
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引用次数: 2

Abstract

In this paper, an innovative PIN diode architecture is proposed and implemented in a 55 nm BiCMOS technology. While ensuring a reverse breakdown voltage < -11 V, a state-of-the-art RON × COFF of 85 fs is achieved and benchmarked with the literature. Those excellent performances pave the way for the development of high performances and highly integrated 5G and 6G millimeter Wave (mmW) Front-End Modules (FEM) in advanced BiCMOS technologies.
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85fs RON×COFF和CP1dB@28GHz > 25dBm创新PIN二极管集成在55纳米BiCMOS技术针对毫米波5G和6G前端模块
本文提出了一种新颖的PIN二极管结构,并在55纳米BiCMOS技术中实现。在确保反向击穿电压< -11 V的同时,实现了85 fs的最先进的RON × COFF,并根据文献进行了基准测试。这些优异的性能为先进BiCMOS技术中高性能和高集成度的5G和6G毫米波(mmW)前端模块(FEM)的发展铺平了道路。
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