Synthesis and characterization of SrTiO/sub 3/ thin films by a modified metalorganic decomposition technique

T. Ng, J.B. Xu, G. Hu, W. Cheung, N. Ke, I. Wilson
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引用次数: 1

Abstract

High quality strontium titanate thin films on platinized Si(100) have been synthesized using non-poisonous inorganic solvent and a layer-by-layer annealing technique at different temperatures. The films have shown good structural and electrical properties. The dielectric constant and dissipation factor at a frequency of 100 MHz are 230 and 0.05, respectively, for a 80 nm thick film annealed at 650/spl deg/C. The capacitance versus applied voltage characteristic shows that the capacitance is almost independent of the applied voltage. The leakage current density is found to be in the order of 10/sup -7/ A/cm/sup 2/ for the film in an applied electric field of about 100 kV/cm.
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改性金属有机分解法制备SrTiO/ sub3 /薄膜及表征
采用无毒性无机溶剂和不同温度逐层退火技术,在铂化Si(100)表面合成了高质量钛酸锶薄膜。薄膜具有良好的结构性能和电性能。当温度为650/spl℃时,80 nm厚薄膜在100 MHz频率下的介电常数为230,耗散系数为0.05。电容随外加电压的特性表明,电容几乎与外加电压无关。在约100 kV/cm的外加电场中,薄膜的泄漏电流密度约为10/sup -7/ A/cm/sup 2/。
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