T. Ng, J.B. Xu, G. Hu, W. Cheung, N. Ke, I. Wilson
{"title":"Synthesis and characterization of SrTiO/sub 3/ thin films by a modified metalorganic decomposition technique","authors":"T. Ng, J.B. Xu, G. Hu, W. Cheung, N. Ke, I. Wilson","doi":"10.1109/HKEDM.2002.1029147","DOIUrl":null,"url":null,"abstract":"High quality strontium titanate thin films on platinized Si(100) have been synthesized using non-poisonous inorganic solvent and a layer-by-layer annealing technique at different temperatures. The films have shown good structural and electrical properties. The dielectric constant and dissipation factor at a frequency of 100 MHz are 230 and 0.05, respectively, for a 80 nm thick film annealed at 650/spl deg/C. The capacitance versus applied voltage characteristic shows that the capacitance is almost independent of the applied voltage. The leakage current density is found to be in the order of 10/sup -7/ A/cm/sup 2/ for the film in an applied electric field of about 100 kV/cm.","PeriodicalId":154545,"journal":{"name":"Proceedings 2002 IEEE Hong Kong Electron Devices Meeting (Cat. No.02TH8616)","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings 2002 IEEE Hong Kong Electron Devices Meeting (Cat. No.02TH8616)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/HKEDM.2002.1029147","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
High quality strontium titanate thin films on platinized Si(100) have been synthesized using non-poisonous inorganic solvent and a layer-by-layer annealing technique at different temperatures. The films have shown good structural and electrical properties. The dielectric constant and dissipation factor at a frequency of 100 MHz are 230 and 0.05, respectively, for a 80 nm thick film annealed at 650/spl deg/C. The capacitance versus applied voltage characteristic shows that the capacitance is almost independent of the applied voltage. The leakage current density is found to be in the order of 10/sup -7/ A/cm/sup 2/ for the film in an applied electric field of about 100 kV/cm.