{"title":"Investigation of the Dynamic Thermal Characteristic in Bulk FinFET","authors":"Zhanfei Chen, Jun Liu, Jia Zhen, Lingling Sun","doi":"10.1109/SISPAD.2018.8551664","DOIUrl":null,"url":null,"abstract":"Knowledge of thermal characteristic in device is valuable to thermal management determination. In this paper, the dynamic thermal characteristic of bulk FinFET is investigated with an analytic method of thermal impedance extraction. The validation of this method is confirmed with the model of smallsignal Y-parameters at low frequency. The results show that, although the saturation current is relatively small, the associated temperature rise is very significant. As comparison, dynamic thermal behavior of SOI is also investigated. The results provide a reliable base for the selection of thermal management algorithms for the circuits carrying various frequency components. This method is easy to scale and adjust to device with different dimension and fabrication processes.","PeriodicalId":170070,"journal":{"name":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2018.8551664","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Knowledge of thermal characteristic in device is valuable to thermal management determination. In this paper, the dynamic thermal characteristic of bulk FinFET is investigated with an analytic method of thermal impedance extraction. The validation of this method is confirmed with the model of smallsignal Y-parameters at low frequency. The results show that, although the saturation current is relatively small, the associated temperature rise is very significant. As comparison, dynamic thermal behavior of SOI is also investigated. The results provide a reliable base for the selection of thermal management algorithms for the circuits carrying various frequency components. This method is easy to scale and adjust to device with different dimension and fabrication processes.