Tunneling and depletion-mode TFTs fabricated by low-temperature stress-assisted Cu-induced lateral growth and metal-free crystallization of germanium

B. Hekmatshoar, S. Mohajerzadeh, D. Shahrjerdi, M. Robertson
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Abstract

Tunneling and depletion-mode poly-Ge TFTs were fabricated at temperatures as low as 150/spl deg/C and 200/spl deg/C respectively. Fabrication of the tunneling TFTs was based on stress-assisted lateral growth of Ge from Cu-seeded islands. In a different approach, depletion-mode TFTs were fabricated, based on metal-free crystallization of Ge by successive steps of hydrogenation and annealing.
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低温应力辅助cu诱导横向生长和锗无金属结晶制备隧道型和耗尽型tft
在低至150/spl℃和200/spl℃的温度下制备隧道型和耗尽型多锗tft。隧道tft的制备是基于cu种子岛中Ge的应力辅助横向生长。在不同的方法中,通过加氢和退火的连续步骤制备了基于Ge无金属结晶的耗尽模式tft。
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