{"title":"A cost effective method to analyze wafer edge structure in high volume manufacturing for 200mm wafer fabs","authors":"H. Ahmataku, K. Kipli","doi":"10.1109/SMELEC.2010.5549538","DOIUrl":null,"url":null,"abstract":"Significant financial profits recognized by reducing the wafer edge exclusion ring in order to increase extra productive dies as well as enhance the yield of the edge-most region of the semiconductor wafer. A method to determine distance of structure from a wafer edge is implemented using software called HandiExclusion v.3 and template named HandieRad. The wafer is put onto the template to get H degree measurement. Program then convert the H degree to a distance measurement from the wafer edge. Scanning Electron Microscope (SEM) Tap-Center Technique used to move precisely at the target distance.","PeriodicalId":308501,"journal":{"name":"2010 IEEE International Conference on Semiconductor Electronics (ICSE2010)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE International Conference on Semiconductor Electronics (ICSE2010)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMELEC.2010.5549538","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Significant financial profits recognized by reducing the wafer edge exclusion ring in order to increase extra productive dies as well as enhance the yield of the edge-most region of the semiconductor wafer. A method to determine distance of structure from a wafer edge is implemented using software called HandiExclusion v.3 and template named HandieRad. The wafer is put onto the template to get H degree measurement. Program then convert the H degree to a distance measurement from the wafer edge. Scanning Electron Microscope (SEM) Tap-Center Technique used to move precisely at the target distance.