Effects of Rapid Thermal Annealing on Nucleation and Growth Behavior of Lead Zirconate Titanate Films

Jian Lu, Yi Zhang, T. Ikehara, Takashi Mihara, R. Maeda
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引用次数: 1

Abstract

This paper investigated the effects of rapid thermal annealing (RTA) on nucleation and growth behavior of sol-gel derived lead zirconate titanate (PZT) films. The effects of RTA on films' surface morphology, residual stress and orientation were also studied. It was found that residual stress of the film can be effectively reduced by extending the RTA time. High heating-rate was preferred for uniform PZT film nucleation and grain-growth, which resulted in dense microstructures and smooth film surface. Low heating-rate lead to strong PZT (100) orientation and low residual stress, but at the risk of film-crack caused by arbitrarily distributed large crystallites of about 300 nm in diameter among those with diameter of ~30 nm.
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快速热处理对锆钛酸铅薄膜成核和生长行为的影响
研究了快速热退火(RTA)对溶胶-凝胶衍生锆钛酸铅(PZT)薄膜成核和生长行为的影响。研究了RTA对薄膜表面形貌、残余应力和取向的影响。结果表明,延长RTA时间可以有效降低薄膜的残余应力。高升温速率有利于PZT薄膜的成核和晶粒的生长,使得薄膜的组织致密,表面光滑。低加热速率使PZT(100)取向强,残余应力小,但在~30 nm的晶粒中,直径约300 nm的大晶粒任意分布,有形成薄膜裂纹的危险。
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