Gallium nitride electronics: Watt is the limit? [summary of GaN semiconductor devices]

U. Mishra
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引用次数: 12

Abstract

This work presents a summary of the use of gallium nitride and its alloys in the development of semiconductor devices. It begins with a description of the HEMT and its use in microwave and power switching applications. Then follows a brief examination of MOSHFETs, MISHFETs and MISFETs. HBTs are discussed, along with the problems of poor electronic properties of p-type GaN and leakage through p-n junctions and etched surfaces. The paper concludes by referring to the POLFET which is based on modulating a 3D electron slab created by grading the polarization in the system, resulting in a MESFET with no doping.
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氮化镓电子学:瓦特是极限?[GaN半导体器件综述]
本文概述了氮化镓及其合金在半导体器件发展中的应用。它首先描述了HEMT及其在微波和功率开关应用中的应用。然后是对moshfet, mishfet和misfet的简要检查。讨论了hbt,以及p型氮化镓电子性能差和通过p-n结和蚀刻表面泄漏的问题。本文最后引用了基于调制三维电子板(通过对系统中的极化进行分级而产生)的MESFET,从而得到了无掺杂的MESFET。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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