Edge-epitaxial Growth of Mos2- Ws2lateral heterostructure and their optoelectronic properties

B. Nayak, S. Chakraborty, Rajdeep Banerjee, Purbasha Ray, Baisali Kundu, S. Bisoyi, R. Basori, Gopal K. Pradhan, D. Goswami, P. Sahoo
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Abstract

We reported the direct growth of electronic grade 2D Mos2- Ws2lateral heterostructures (LHS) by controlling critical physicochemical parameters using a water-assisted chemical vapor deposition technique. Raman and photoluminescence spectroscopy and transport measurements were used to standardize their optical and electronic characteristics. In addition, the role of metal contacts in the transport characteristics in the field-effect transistor geometry of the LHS was evaluated.
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Mos2- ws2横向异质结构的边外延生长及其光电性能
本文报道了利用水辅助化学气相沉积技术,通过控制关键理化参数,直接生长电子级二维Mos2- ws2横向异质结构(LHS)。利用拉曼光谱和光致发光光谱以及输运测量来规范其光学和电子特性。此外,还评估了金属触点在LHS场效应晶体管几何结构中输运特性中的作用。
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