Tin dioxide sol-gel derived thin films deposited on porous silicon

C. Cobianu, C. Savaniu, O. Buiu, D. Dascalu, M. Zaharescu, C. Parlog, A. V. D. Berg, B. Pécz
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引用次数: 47

Abstract

SnO/sub 2/ and SnO/sub 2/:Sb sol-gel derived thin films have been prepared from tin (II) ethylhexanoate and tin (IV) ethoxide precursors (the later not reported before) in order to be used for gas sensing applications where porous silicon is used as a substrate. Transparent, crack-free and adherent layers were obtained on different types of substrates (Si, SiO/sub 2//Si). By energy dispersive X-ray spectroscopy (EDXS) performed on the cross section of the porosified silicon (PS) coupled with XTEM analysis, the penetration of the SnO/sub 2/ sol-phase in the nanometric pores followed by the SnO/sub 2/ consolidation film in the pores of the PS, during subsequent annealing at 500/spl deg/C has been experimentally proved.
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二氧化锡溶胶-凝胶衍生薄膜沉积在多孔硅上
SnO/sub 2/和SnO/sub 2/:Sb溶胶-凝胶衍生薄膜已由锡(II)乙基己酸盐和锡(IV)乙氧化物前驱体(后者以前未报道)制备,以便用于多孔硅作为衬底的气敏应用。在不同类型的衬底(Si, SiO/sub 2//Si)上获得了透明、无裂纹和粘附层。通过对多孔硅(PS)的横截面进行能量色散x射线能谱(EDXS)和XTEM分析,实验证明了在500/spl℃的退火过程中,SnO/sub - 2/溶胶相在纳米孔中渗透,然后在PS孔中形成SnO/sub - 2/固结膜。
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