Flash Evaporated Thin Films of Bismuth Telluride

K. Miyazaki, T. Shirakawa, H. Tsukamoto
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引用次数: 3

Abstract

In this study, thermoelectric thin films are deposited on glass plates by using a flash evaporation method. We evaporated fine powders of 20% Bi2Te3-80% Sb2Te3 as a p-type and those of 90% Bi2Te3-10% Bi2Se3 as an n-type. We measured thermoelectric properties, such as Seebeck coefficient, alpha, the electrical resistivity, rho, and thermal conductivity, lambda, at room temperature. Flash evaporated p-type thin films show high values of thermoelectric properties: alpha = 199 muV/K, and rho = 14 mOmegamiddotcm at 300 K, and the n-type thin films show alpha = -30 muV/K, and rho = 3 mOmegamiddotcm. The fabricated thin films are annealed at 200 to 400 degC for 1 hour in argon for the improvement of the thermoelectric properties. The electrical resistivity of the p-type thin films reduces as annealing temperature increases, and it reaches 1.8 mOmegamiddotcm at annealing temperature of 400 degC. Seebeck coefficient of the thin films reaches 218 muV/K at annealing temperature of 300 degC. On the other hand, the electrical resistivity of the n-type thin films reduces to 2 mOmegamiddotcm at annealing temperature of 350 degC, and Seebeck coefficient of the thin films increases to -163 muV/K at annealing temperature of 300 degC. The measured thermal conductivity of an n-type thin film annealed at 200 degC is 1.2 W/(mmiddotK). EPMA measurements and SEM observations are carried out to consider the mechanisms of improvements of thermoelectric properties
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闪蒸碲化铋薄膜
本研究采用闪蒸法在玻璃板上沉积热电薄膜。我们蒸发了20% Bi2Te3-80% Sb2Te3的细粉为p型,90% Bi2Te3-10% Bi2Se3的细粉为n型。我们在室温下测量了热电性能,如塞贝克系数,α,电阻率,rho和导热系数,lambda。闪蒸p型薄膜在300 K时表现出较高的热电性能:α = 199 muV/K, rho = 14 mOmegamiddotcm; n型薄膜在300 K时表现出α = -30 muV/K, rho = 3 mOmegamiddotcm。制备的薄膜在200 ~ 400℃氩气中退火1小时,以改善热电性能。p型薄膜的电阻率随退火温度的升高而降低,在400℃退火时达到1.8 μ m。在300℃的退火温度下,薄膜的塞贝克系数达到218 muV/K。另一方面,在350℃的退火温度下,n型薄膜的电阻率降低到2 μ m /K,在300℃的退火温度下,薄膜的塞贝克系数增加到-163 μ v /K。经200℃退火的n型薄膜的热导率为1.2 W/(middotk)。进行了EPMA测量和SEM观察,探讨了热电性能改善的机理
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