G. Atmaca, M. Jaud, Julien Buckley Jérôme, A. Yvon, E. Collard
{"title":"Surge Current Capability in lateral AlGaN/GaN Hybrid Anode Diodes with p-GaN/Schottky Anode","authors":"G. Atmaca, M. Jaud, Julien Buckley Jérôme, A. Yvon, E. Collard","doi":"10.23919/SISPAD49475.2020.9241673","DOIUrl":null,"url":null,"abstract":"In lateral power diodes, the conductivity modulation mechanism can pave the way to the demonstration of surge current capability. In a Hybrid Anode Diode concept with a p-GaN layer, an anode contact on p-GaN layer can be a source of hole injection that increases the electron density at AlGaN/GaN interface. The role of p-GaN layer on the surge current capability and its demonstration are investigated through TCAD simulations that explain the role of hole barrier tunneling at anode metal/p-GaN interface. These simulations show that surge current can occur in case of Ohmic p-GaN contact as the injected holes can lead to create additional electron density in the channel as well as a hole current to support the total diode current.","PeriodicalId":206964,"journal":{"name":"2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","volume":"38 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-09-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/SISPAD49475.2020.9241673","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
In lateral power diodes, the conductivity modulation mechanism can pave the way to the demonstration of surge current capability. In a Hybrid Anode Diode concept with a p-GaN layer, an anode contact on p-GaN layer can be a source of hole injection that increases the electron density at AlGaN/GaN interface. The role of p-GaN layer on the surge current capability and its demonstration are investigated through TCAD simulations that explain the role of hole barrier tunneling at anode metal/p-GaN interface. These simulations show that surge current can occur in case of Ohmic p-GaN contact as the injected holes can lead to create additional electron density in the channel as well as a hole current to support the total diode current.