The potential use of spark ablation in development of AgNP decorated copper oxide thin films for photodetection applications

Floren Radovanović-Perić, V. Mandić, I. Panžić
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Abstract

Recently, CuO (p-type) semiconductor thin films have been investigated for sensing applications due to their excellent optical properties and narrow bandgap. It has been proposed that the performance of CuO thin films in photosensing applications depends strongly on the grain size, morphology and nanostructure which introduces the possibility of fabricating these materials by spark ablation, a novel, low cost and efficient method capable of producing controlled and clean nanoparticles with various subsequent deposition methods that further broaden the synthesis possibilities. Here we investigated the potential of this method for fabricating photosensing devices through the ability to control the properties of both the deposited copper oxide thin-films as well as nanoparticles of gold. Copper oxide films were obtained on Si wafers by; i) vacuum jet deposition of either Cu or CuxOy layers that were thermally treated to obtain pure CuO phase, ii) spin coating of the Cu or CuxOy nanoparticles (NPs) solution produced by spark ablation which were collected in 2-methoxyethanol. After the CuO nanofilms were obtained, they were decorated with AuNPs by vacuum jet deposition. Phase purity, morphology and particle size were investigated by Grazing Incidence X-ray Diffraction (GIXRD), Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM), while optical absorption was determined by UV/Vis spectrometry and photoluminescence spectroscopy (PL). To determine the photocurrent, I/V characteristics were performed both in light and dark conditions. It was determined that produced films show comparable properties with competitive commercial devices.
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火花烧蚀技术在开发用于光探测的AgNP修饰氧化铜薄膜中的潜在应用
近年来,CuO (p型)半导体薄膜由于其优异的光学性能和窄带隙而被研究用于传感应用。有人提出,CuO薄膜在光敏应用中的性能在很大程度上取决于晶粒尺寸、形貌和纳米结构,这就引入了通过火花烧蚀制造这些材料的可能性,这是一种新颖、低成本和高效的方法,能够通过各种后续沉积方法生产可控和清洁的纳米颗粒,从而进一步扩大了合成的可能性。在这里,我们通过控制沉积的氧化铜薄膜和金纳米颗粒的性能,研究了这种方法制造光敏器件的潜力。在硅片上制备了铜氧化物薄膜;i)真空喷射沉积Cu或CuxOy层,并对其进行热处理以获得纯CuO相;ii)在2-甲氧基乙醇中收集的火花烧蚀产生的Cu或CuxOy纳米粒子(NPs)溶液进行自旋涂层。制备出CuO纳米膜后,采用真空喷射沉积法对纳米膜进行aunp修饰。采用掠入射x射线衍射(GIXRD)、原子力显微镜(AFM)和扫描电镜(SEM)研究相纯度、形貌和粒度,采用紫外/可见光谱法和光致发光光谱法(PL)测定光吸收。为了确定光电流,在光照和黑暗条件下都进行了I/V特性测试。经确定,所生产的薄膜具有与竞争性商业设备相当的性能。
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