{"title":"Operational Energy Analysis of Plasmonic Imaging Lithography","authors":"T. Zhang, S. W. Bates, D. Dornfeld","doi":"10.1109/ISEE.2007.369374","DOIUrl":null,"url":null,"abstract":"Plasmonic imaging lithography (PIL) is a new direct-write lithograghy process based on disk drive technology. Using the benchmark of similarly scaled masked and maskless lithography processes, this paper evaluates the operational energy use of PIL, as a component of manufacturing and environmental impact analysis. This study serves two purposes: to inform the sustainable development of this emerging technology, and to identify PIL as most appropriate for prototyping or highly agile manufacturing of 11 or fewer wafers per design change.","PeriodicalId":275164,"journal":{"name":"Proceedings of the 2007 IEEE International Symposium on Electronics and the Environment","volume":"95 4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-05-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 2007 IEEE International Symposium on Electronics and the Environment","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISEE.2007.369374","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Plasmonic imaging lithography (PIL) is a new direct-write lithograghy process based on disk drive technology. Using the benchmark of similarly scaled masked and maskless lithography processes, this paper evaluates the operational energy use of PIL, as a component of manufacturing and environmental impact analysis. This study serves two purposes: to inform the sustainable development of this emerging technology, and to identify PIL as most appropriate for prototyping or highly agile manufacturing of 11 or fewer wafers per design change.
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