{"title":"MBE growth of GaN","authors":"M.A.L. Johnson, Zhonghai Yu, N. El-Masry, J. Cook, J. Schetzina","doi":"10.1109/LEOSST.1997.619233","DOIUrl":null,"url":null,"abstract":"GaN has been grown by MBE at growth rates up to 1 /spl mu/m/hr and at temperatures up to 1000 C using a new rf nitrogen plasma source developed by EPI Inc. The EPI source employs a pyrolytic boron nitride plasma reaction chamber that eliminates gas leakage. This \"unibulb\" construction gives rise to higher pressures and longer confinement times within the reaction chamber. Optical IR emission spectra show that the nitrogen plasma is very rich in nitrogen atoms.","PeriodicalId":344325,"journal":{"name":"1997 Digest of the IEEE/LEOS Summer Topical Meeting: Vertical-Cavity Lasers/Technologies for a Global Information Infrastructure/WDM Components Technology/Advanced Semiconductor Lasers and Application","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-08-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 Digest of the IEEE/LEOS Summer Topical Meeting: Vertical-Cavity Lasers/Technologies for a Global Information Infrastructure/WDM Components Technology/Advanced Semiconductor Lasers and Application","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/LEOSST.1997.619233","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

GaN has been grown by MBE at growth rates up to 1 /spl mu/m/hr and at temperatures up to 1000 C using a new rf nitrogen plasma source developed by EPI Inc. The EPI source employs a pyrolytic boron nitride plasma reaction chamber that eliminates gas leakage. This "unibulb" construction gives rise to higher pressures and longer confinement times within the reaction chamber. Optical IR emission spectra show that the nitrogen plasma is very rich in nitrogen atoms.
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GaN的MBE生长
使用EPI公司开发的新型射频氮等离子体源,MBE以高达1 /spl mu/m/hr的生长速率和高达1000℃的温度生长GaN。EPI源采用热解氮化硼等离子体反应室,可消除气体泄漏。这种“单球”结构在反应室内产生更高的压力和更长的约束时间。红外光谱表明,氮等离子体中含有丰富的氮原子。
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