Power QFN down bond lift and delamination study

Hanmin Zhang, M. Hu, Sonder Wang, Schmadlak Ilko, B. Yin, Q. He, D. Ye
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引用次数: 3

Abstract

The PQFN device revealed down bond lift and delamination issues. Based on AES (Auger Electron Spectroscopy), XPS (X-ray Photoelectron Spectroscopy) and FTIR (Fourier Transform Infrared Spectroscopy) analysis it was possible to verify that a down bond contamination caused the failure. Cross sections of down bond wire for the failed unit showed a broken heel on the down bond. Furthermore, cracking between molding compound and lead frame was found. It was proven that the delamination caused the down bond lift and the broken heel. FEA (Finite Element Analysis) revealed that the delamination can lead to shear stress increase at the down bond heel.
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功率QFN下键提升和分层研究
PQFN装置揭示了下键提升和分层问题。基于AES(俄歇电子能谱)、XPS (x射线光电子能谱)和FTIR(傅里叶变换红外光谱)分析,可以验证是下键污染导致了故障。故障单元的下键线的横截面显示下键上有一个断裂的后跟。此外,还发现了模塑料与引线框架之间的开裂现象。结果表明,脱层是导致下粘结层升高和足跟断裂的主要原因。有限元分析表明,分层会导致下粘结跟处剪应力增大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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