Approaches and options for modeling sub-0.1 /spl mu/m CMOS devices

M. Chan, X. Xi, Jin He, C. Hu
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引用次数: 1

Abstract

This paper attempts to provide a general guideline to develop a practical model for MOSFETs in the sub 0,1 /spl mu/m generations. It starts by giving an overview of the different modeling approaches and options including charge based approach, surface potential based approach, and conductance based approach. Their relative advantages and weaknesses will be discussed. The evolution of the BSIM models from its first generation to the most recent release will be used as an example for the development of a practical device model. It will be followed by a discussion on how the accelerated technology development may impact the traditional modeling approaches. A new paradigm to incorporate modem software engineering methodology to shorten model development cycle will be presented.
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0.1 /spl μ m以下CMOS器件的建模方法和选项
本文试图提供一个通用的指导方针,以开发一个实用的模型,在sub,1 /spl μ m /m代mosfet。首先概述了不同的建模方法和选项,包括基于电荷的方法、基于表面电位的方法和基于电导的方法。他们的相对优势和劣势将被讨论。BSIM模型从第一代到最新版本的演变将被用作开发实用设备模型的示例。随后将讨论加速的技术发展如何影响传统的建模方法。提出了一种结合现代软件工程方法来缩短模型开发周期的新范例。
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