An enhancement mode GaN MOSFET with AlGaN/GaN heterostructure

Arun Sunny, S. S. Chauhan
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引用次数: 3

Abstract

An enhancement mode GaN MOSFET with AlGaN/GaN heterostructure for excessive frequency and excessive power applications is designed. The huge 2 dimensional electron gas density obtained at the AlGaN/GaN heterostructure helps to carry more output current, which needs for high output power generation. Normally off behaviour of the device is obtained by the replacement of AlGaN barrier layer with gate insulator, which helps to reduce the power dissipation from the device. Initial Two Dimensional simulations in Sentaurus TCAD showed that the threshold voltage of the device is nearly 0.6V and output current obtained is about 4.5×10-2 A at 10 V gate supply.
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一种具有AlGaN/GaN异质结构的增强模式GaN MOSFET
设计了一种具有AlGaN/GaN异质结构的增强型GaN MOSFET,用于高频率和高功率应用。在AlGaN/GaN异质结构上获得的巨大的二维电子气体密度有助于携带更多的输出电流,这需要高输出功率。通常情况下,器件的关闭行为是通过用栅极绝缘体替换AlGaN阻挡层来获得的,这有助于减少器件的功耗。在Sentaurus TCAD中进行的初始二维仿真表明,该器件的阈值电压接近0.6V,在10v栅极电源下获得的输出电流约为4.5×10-2 A。
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