The Growth and Influencing Factors of Voids in SnAg Solder Bump and their Impact on Interfacial Bond Strength

Xiaoqin Lin, L. Luo
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引用次数: 2

Abstract

With the trend toward lead-free and miniaturization in consumer electronics, sub 100 micron lead-free solder bumping and its related reliability are becoming one of the important issues in today's electronic packaging industry. The growth and influencing factors of voids in the interfacial region of electroplated Sn-3.0 Ag solder bumps on electroplated Cu and their effects on interfacial bonding strength during multi-reflow and aging process were studied. Results show that the volume shrinkage during the phase transformation was the main reason for the void formation during multi-reflow. The Kirkendall effect was the main reason for the void formation during aging. A thick eta-phase and the voids at the boundaries among Cu6Sn5 grains promoted the voids growth in the epsiv-phase. Though the formation of voids had a trivial weakening effect to the shear strength of solder joints, the voids were a threat to the bonding reliability of solder bumps.
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SnAg钎料凸起中空隙的生长、影响因素及其对界面结合强度的影响
随着消费类电子产品的无铅化和小型化趋势,100微米以下无铅焊料碰撞及其可靠性已成为当今电子封装行业的重要问题之一。研究了在多次回流和时效过程中,镀Sn-3.0 Ag钎料凸点与镀Cu钎料凸点界面区域空隙的生长和影响因素及其对界面结合强度的影响。结果表明,相变过程中的体积收缩是多次回流过程中气孔形成的主要原因。Kirkendall效应是时效过程中空洞形成的主要原因。厚的eta相和Cu6Sn5晶粒边界处的孔洞促进了epsiv相中孔洞的生长。虽然孔洞的形成对焊点的剪切强度影响不大,但孔洞对焊点的连接可靠性构成威胁。
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