Differential DIMM OpenCAPI Memory Interface High Speed Channel Robustness and Scalability Study

Biao Cai, Kevin Mcilvain, Junyan Tang, Kyle Giesen, Zhaoqing Chen, Hongqing Zhang, B. Beaman, Chris Steffen, Zhineng Fan, Victor Mahran, Luis Fukazawa, Roc Lv
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Abstract

Differential DIMM (DDIMM) is being defined in JEDEC and uses OMI as a host interface with the data transfer rate being specified at 25.6Gb/s at present and at 51.2Gb/s in the future. A prior 2019∼20 study [13] of full channel simulation and electrical test with initial DDR4 DDIMM engineering samples demonstrated the feasibility to achieve BER 10^-15 at 25.6Gb/s OMI bus data rate. In this study, the test result in production environment with much larger DDR4 DDIMM sample size will be analyzed for 25.6Gb/s OMI channel robustness. In addition, this study will explore the OMI bus data rate scale to 32Gb/s with the full channel time domain eye diagram analysis with BER at 10^-15. The prior studies in 2018∼20 [1], [13] concluded that the typical Copper Clad Laminate (CCL) and prepreg material used in the industry standard U/R/LR DIMM leads to signal integrity degradation relative to a better reference material at 25.6Gb/s OMI bus data rate while the improved DDIMM PCB stack-up with hybrid laminate material set has shown adequate margin. The DDIMM PCB stack-ups of this study include this hybrid material as baseline and lower loss Megtron 6 like material sets. DDIMM will be paired with the Storage Networking Industry Association (SNIA) SFF-TA-1002 high speed connector. The signal integrity challenges of DDIMM PCB contact interface to SFF-TA-1002 connector have been highlighted in the prior studies in 2018∼20[1], [13]. This study will discuss the contact interface robustness. In summary, this paper will present DDR4 DDIMM 25.6Gb/s OMI channel robustness study and the OMI channel scalability study to 32Gb/s which is planned for DDR5 DDIMM at product launch.
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差分DIMM OpenCAPI内存接口高速通道鲁棒性与可扩展性研究
JEDEC正在定义差分DIMM (DDIMM),它使用OMI作为主机接口,目前的数据传输率为25.6Gb/s,未来的数据传输率为51.2Gb/s。2019 ~ 2020年之前的一项研究[13]对初始DDR4 DDIMM工程样品进行了全通道模拟和电气测试,证明了在25.6Gb/s OMI总线数据速率下实现BER 10^-15的可行性。在本研究中,我们将对25.6Gb/s OMI通道鲁棒性在生产环境下使用更大DDR4 DDIMM样本量的测试结果进行分析。此外,本研究将探索OMI总线数据速率规模为32Gb/s的全通道时域眼图分析,误码率为10^-15。2018 ~ 20年的先前研究[1],[13]得出结论,工业标准U/R/LR DIMM中使用的典型覆铜层压板(CCL)和预浸料材料相对于更好的参考材料在25.6Gb/s OMI总线数据速率下导致信号完整性下降,而采用混合层压板材料的改进DDIMM PCB堆叠显示出足够的空间。本研究的DDIMM PCB堆叠包括这种混合材料作为基准和低损耗的Megtron 6材料集。DDIMM将与存储网络行业协会(SNIA) SFF-TA-1002高速连接器配对。SFF-TA-1002连接器的DDIMM PCB接触接口的信号完整性挑战已在2018 ~ 20年的先前研究中得到强调[1],[13]。本研究将讨论接触界面的鲁棒性。综上所述,本文将介绍DDR4 DDIMM 25.6Gb/s OMI通道鲁棒性研究和计划在产品发布时用于DDR5 DDIMM的32Gb/s OMI通道可扩展性研究。
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