Asynchronous 1R-1W dual-port SRAM by using single-port SRAM in 28nm UTBB-FDSOI technology

Harsh Rawat, K. Bharath, Alexander Fell
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引用次数: 1

Abstract

With the advancement in technology nodes, the number of components operating in different clock domains in a System on Chip (SoC) increases. Asynchronous multi-port memory with dedicated write and read ports is used to allow data to cross clock domain boundaries. The dual-port memory architecture introduced in this paper, is based on the Single-Port SRAM (SP-SRAM) that can be generated in larger capacities with better performance statistics compared to the Dual-Port SRAM (DP-SRAM). The proposed design has been evaluated by comparing existing dual-port 1R-1W and 2RW designs in 28nm Ultra Thin Body and Box Fully Depleted Silicon on Insulator (UTBB-FDSOI) technology. A memory with a capacity of 2048 words with 64 bits, shows 15%, 35%, 28% and 4.5% improvement in read power, write power, read-write power consumption and performance respectively over conventional 1R-1W DP-SRAM with equal area. The synthesis with area optimizations applied instead, shows an area advantage of 50% over conventional 1R-1W DP-SRAM, but with a degradation in performance.
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异步1R-1W双端口SRAM采用单端口SRAM在28nm UTBB-FDSOI技术
随着技术节点的进步,在片上系统(SoC)中工作在不同时钟域的组件数量增加。异步多端口内存与专用的写和读端口被用来允许数据跨越时钟域边界。本文介绍的双端口内存架构是基于单端口SRAM (SP-SRAM),与双端口SRAM (DP-SRAM)相比,它可以产生更大的容量和更好的性能统计数据。通过比较现有的双端口1R-1W和2RW设计在28nm超薄机身和盒式完全耗尽绝缘体上硅(UTBB-FDSOI)技术,对所提出的设计进行了评估。与同等面积的1R-1W DP-SRAM相比,2048字64位内存的读功率、写功率、读写功耗和性能分别提高了15%、35%、28%和4.5%。与传统的1R-1W DP-SRAM相比,采用面积优化的合成显示出50%的面积优势,但性能有所下降。
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