Interactions between Terrestrial Cosmic-Ray Neutrons and III–V Compound Semiconductors

D. Munteanu, J. Autran
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引用次数: 1

Abstract

This work explores by numerical simulation the impact of high-energy atmospheric neutrons and their interactions with III–V binary compound semiconductors. The efforts have focused on eight III–V semiconductors: GaAs, AlAs, InP, InAs, GaSb, InSb, GaN, and GaP. For each material, extensive Geant4 numerical simulations have been performed considering a bulk target exposed to a neutron source emulating the atmospheric neutron spectrum at terrestrial level. Results emphasize in detail the reaction rates per type of reaction (elastic, inelastic, nonelastic) and offer a classification of all the neutron-induced secondary products as a function of their atomic number, kinetic energy, initial stopping power, and range. Implications for single-event effects (SEEs) are analyzed and discussed, notably in terms of energy and charge deposited in the bulk material and in the first nanometers of particle range with respect to the critical charge for modern complementary metal oxide semiconductor (CMOS) technologies.
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地球宇宙射线中子与III-V化合物半导体的相互作用
本工作通过数值模拟探讨了高能大气中子的影响及其与III-V二元化合物半导体的相互作用。这些努力集中在八种III-V半导体上:GaAs, AlAs, InP, InAs, GaSb, InSb, GaN和GaP。对于每种材料,已经进行了广泛的Geant4数值模拟,考虑了暴露在模拟地面大气中子谱的中子源中的大块目标。结果详细强调了每种反应类型(弹性、非弹性、非弹性)的反应速率,并提供了所有中子诱导的二次产物的分类,作为它们的原子序数、动能、初始停止功率和范围的函数。分析和讨论了单事件效应(SEEs)的含义,特别是在块体材料中沉积的能量和电荷以及与现代互补金属氧化物半导体(CMOS)技术的临界电荷相关的第一纳米颗粒范围内。
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