Leakage current variability in nanometer technologies

M. Anis, M. Abu-Rahma
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引用次数: 27

Abstract

The dramatic increase in leakage current coupled with the large increase in variability in highly scaled CMOS technologies, pose a major challenge for future IC design. Leakage variability can not be neglected any more, due to the increase of leakage power percentage in modern ICs. In this paper, the main sources of variations and how they impact leakage current are discussed. Design guidelines to reduce variability based on several leakage reduction techniques are also presented. It is shown that reverse body bias technique increases leakage variability due to its deteriorating effect on drain-induced barrier lowering (DIBL). This paper highlights the need for further efforts in the area of statistical leakage estimation, as well as variation tolerant circuit techniques.
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纳米技术中的泄漏电流变异性
泄漏电流的急剧增加,加上高尺度CMOS技术的可变性大幅增加,对未来的IC设计构成了重大挑战。由于现代集成电路中泄漏功率百分比的增加,泄漏变异性已不能再被忽视。本文讨论了变化的主要来源及其对漏电流的影响。还提出了基于几种减少泄漏技术来减少可变性的设计指南。结果表明,反向体偏置技术由于其对排水诱导屏障降低(DIBL)的影响恶化而增加了泄漏变异性。本文强调了在统计泄漏估计以及容差电路技术方面需要进一步努力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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