High performance logic devices based on single crystalline ZnO nanorods

Won n Park, Jin Suk Kim, JinKyung Yoo, G. Yi
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Abstract

A variety of elements and crystal structures of metal oxides allows for the integration of many magnetic, electronic, and optoelectronic functions into the materials, providing significant potential for realizing a diverse range of active devices [1]. For example, transparent conducting oxides (TCOs) such as indium-tin-oxide (ITO), SnO2, and ZnO have widely been used as window electrodes for flat panel displays, touch panels, and solar cells because of their unique features of excellent optical transparency and controllable electrical conductivity by impurity doping. Conventional TCOs have also been studied as semiconducting channel of thin-film transistors (TFTs) for invisible electronic circuit applications, but which are limited by the poor device performance resulting from the lack of high quality oxide semiconductor materials. The key parameters of SnO2 and ZnO TFTs, field-effect mobilities have been ranged from 0.1 to 10 cm2/Vs [2]. Since charge scattering by ionized impurities and grain-boundaries is thought to limit the performance, preparation of high-quality single-crystalline TCO with a low background carrier concentration is challengeable.
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基于单晶ZnO纳米棒的高性能逻辑器件
金属氧化物的各种元素和晶体结构允许将许多磁性、电子和光电子功能集成到材料中,为实现各种有源器件提供了巨大的潜力[1]。例如,透明导电氧化物(tco),如铟锡氧化物(ITO), SnO2和ZnO,由于其具有优异的光学透明度和通过杂质掺杂可控制电导率的独特特性,已广泛用于平板显示器,触摸面板和太阳能电池的窗口电极。传统的tco作为薄膜晶体管(TFTs)的半导体通道也被研究用于不可见电子电路,但由于缺乏高质量的氧化物半导体材料,器件性能较差,限制了其应用。SnO2和ZnO tft的关键参数场效应迁移率范围为0.1 ~ 10 cm2/Vs[2]。由于离子杂质和晶界的电荷散射被认为限制了性能,因此制备具有低背景载流子浓度的高质量单晶TCO是具有挑战性的。
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