Optimizing the operating voltage of tunnel FET-based SRAM arrays equipped with read/write assist circuitry

H. Afzali-Kusha, A. Shafaei, Massoud Pedram
{"title":"Optimizing the operating voltage of tunnel FET-based SRAM arrays equipped with read/write assist circuitry","authors":"H. Afzali-Kusha, A. Shafaei, Massoud Pedram","doi":"10.1145/2902961.2903031","DOIUrl":null,"url":null,"abstract":"This paper deals with obtaining the minimum operating voltage of memory arrays based on TFET SRAM cells. First, we compare the I-V characteristics of two TFETs and one FDSOI using SPICE simulations. The results reveal that TFET devices exhibit high ON/OFF current ratios at different power supply voltage levels. This observation suggests a higher stability for SRAM cells based on these devices. Next, the characteristics of 6T SRAM cells implemented using minimum sized transistors based on these three device structures are compared. The comparison, which considers two TFET cell structures, i.e., inward and outward SRAMs, is performed at different supply voltages. The results for the hold static noise margin show that at low supply voltages (i.e., below 300mV), the FDSOI SRAM cell cannot hold data whereas both the inward and outward structures of TFET have acceptable noise margins at all supply voltages. Among the two TFET structures, the outward cell is selected because of higher speed especially for the write operation. TFET SRAMs suffer from long read access latency at ultra-low supply voltages (e.g., 150mV). The problem, however, may be overcome by using the negative GND read-assist technique. The results show that for a 32×32 TFET outward SRAM array, the minimum energy consumption (energy-delay product) may be achieved at the supply voltage of 200mV (300mV) with 1.32GHz (4.55GHz) as the read access frequency.","PeriodicalId":407054,"journal":{"name":"2016 International Great Lakes Symposium on VLSI (GLSVLSI)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 International Great Lakes Symposium on VLSI (GLSVLSI)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1145/2902961.2903031","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

This paper deals with obtaining the minimum operating voltage of memory arrays based on TFET SRAM cells. First, we compare the I-V characteristics of two TFETs and one FDSOI using SPICE simulations. The results reveal that TFET devices exhibit high ON/OFF current ratios at different power supply voltage levels. This observation suggests a higher stability for SRAM cells based on these devices. Next, the characteristics of 6T SRAM cells implemented using minimum sized transistors based on these three device structures are compared. The comparison, which considers two TFET cell structures, i.e., inward and outward SRAMs, is performed at different supply voltages. The results for the hold static noise margin show that at low supply voltages (i.e., below 300mV), the FDSOI SRAM cell cannot hold data whereas both the inward and outward structures of TFET have acceptable noise margins at all supply voltages. Among the two TFET structures, the outward cell is selected because of higher speed especially for the write operation. TFET SRAMs suffer from long read access latency at ultra-low supply voltages (e.g., 150mV). The problem, however, may be overcome by using the negative GND read-assist technique. The results show that for a 32×32 TFET outward SRAM array, the minimum energy consumption (energy-delay product) may be achieved at the supply voltage of 200mV (300mV) with 1.32GHz (4.55GHz) as the read access frequency.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
具有读写辅助电路的隧道场效应晶体管SRAM阵列的工作电压优化
本文研究了基于tefet SRAM单元的存储阵列的最小工作电压的获取问题。首先,我们使用SPICE模拟比较了两个tfet和一个FDSOI的I-V特性。结果表明,在不同的电源电压水平下,TFET器件具有较高的开/关电流比。这一观察结果表明,基于这些器件的SRAM电池具有更高的稳定性。接下来,比较了基于这三种器件结构的最小尺寸晶体管实现的6T SRAM单元的特性。在不同的电源电压下进行比较,考虑了两种TFET电池结构,即向内和向外sram。保持静态噪声裕度的结果表明,在低电源电压下(即低于300mV), FDSOI SRAM单元不能保持数据,而TFET的内向和外向结构在所有电源电压下都具有可接受的噪声裕度。在这两种结构中,选择向外的晶体管是因为它具有更高的速度,特别是对于写入操作。在超低电源电压(例如150mV)下,ttfet sram的读取访问延迟较长。然而,这个问题可以通过使用负GND读取辅助技术来克服。结果表明,对于32×32 TFET外置SRAM阵列,在电源电压为200mV (300mV)、读取接入频率为1.32GHz (4.55GHz)时,能量消耗(能量延迟积)最小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Concurrent error detection for reliable SHA-3 design Task-resource co-allocation for hotspot minimization in heterogeneous many-core NoCs Multiple attempt write strategy for low energy STT-RAM An enhanced analytical electrical masking model for multiple event transients A novel on-chip impedance calibration method for LPDDR4 interface between DRAM and AP/SoC
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1