Fabrication of atomically precise, super smooth, and damage-free x-ray optics

P. V. Bui, Masahiko Kanaoka, M. Yabashi, Tetsuya Ishikawa, Y. Sano, K. Yamauchi
{"title":"Fabrication of atomically precise, super smooth, and damage-free x-ray optics","authors":"P. V. Bui, Masahiko Kanaoka, M. Yabashi, Tetsuya Ishikawa, Y. Sano, K. Yamauchi","doi":"10.1117/12.2668438","DOIUrl":null,"url":null,"abstract":"An atomically precise, super smooth, and damage-free surface is highly demanded for x-ray mirrors, multilayer optics, channel-cut crystal monochromators (CCM), and gratings. An ultra-precision optic with a figure error of several nm is crucial for single-nanometer spatial resolution, signal strength, and contrast. Moreover, sub-angstrom root-mean-square surface roughness is beneficial for high reflectivity and the lowest unwanted scattering. Additionally, a damage-free surface with no alter layer is greatly desired for CCM and grating substrates because it is essential for the high reflectivity of the CCM and the uniform etching rate of the grating’s ruling. In the manufacturing of x-ray mirrors, to obtain the desired figure error, a non-contact figuring method, such as ion beam figuring (IBF), plasma chemical vaporization machining (PCVM), or Elastic Emission Machining (EEM), is usually employed thanks to its high controllability and stability. EEM has proved the best performance in terms of achieving a low figure error and maintaining a good surface roughness. After shaping/figuring, a finishing method is usually applied to improve its surface roughness without distorting its figure error. Recently, Catalyst-Referred Etching (CARE) has realized its potential and applicability to x-ray mirror manufacturing as a finishing method. Thanks to its removal mechanism, a highly ordered surface with a root-mean-square of 0.03 nm RMS is attained. In the polishing of a CCM, because a mechanical method is usually used to polish its surface at the narrow gap, the residual mechanical damage induced a low reflectivity and low spatial resolution. PCVM with a wire electrode has recently been proposed and demonstrated its excellent performance. The damage-free surface of a CCM with a gap of less than 100µm has been successfully realized by PCVM. In this paper, recent achievements in figuring (EEM), surface finishing (CARE), and damage removal (PCVM) are presented and discussed.","PeriodicalId":376481,"journal":{"name":"Optics + Optoelectronics","volume":"12581 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics + Optoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2668438","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

An atomically precise, super smooth, and damage-free surface is highly demanded for x-ray mirrors, multilayer optics, channel-cut crystal monochromators (CCM), and gratings. An ultra-precision optic with a figure error of several nm is crucial for single-nanometer spatial resolution, signal strength, and contrast. Moreover, sub-angstrom root-mean-square surface roughness is beneficial for high reflectivity and the lowest unwanted scattering. Additionally, a damage-free surface with no alter layer is greatly desired for CCM and grating substrates because it is essential for the high reflectivity of the CCM and the uniform etching rate of the grating’s ruling. In the manufacturing of x-ray mirrors, to obtain the desired figure error, a non-contact figuring method, such as ion beam figuring (IBF), plasma chemical vaporization machining (PCVM), or Elastic Emission Machining (EEM), is usually employed thanks to its high controllability and stability. EEM has proved the best performance in terms of achieving a low figure error and maintaining a good surface roughness. After shaping/figuring, a finishing method is usually applied to improve its surface roughness without distorting its figure error. Recently, Catalyst-Referred Etching (CARE) has realized its potential and applicability to x-ray mirror manufacturing as a finishing method. Thanks to its removal mechanism, a highly ordered surface with a root-mean-square of 0.03 nm RMS is attained. In the polishing of a CCM, because a mechanical method is usually used to polish its surface at the narrow gap, the residual mechanical damage induced a low reflectivity and low spatial resolution. PCVM with a wire electrode has recently been proposed and demonstrated its excellent performance. The damage-free surface of a CCM with a gap of less than 100µm has been successfully realized by PCVM. In this paper, recent achievements in figuring (EEM), surface finishing (CARE), and damage removal (PCVM) are presented and discussed.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
制造原子精度,超光滑,和无损伤的x射线光学
对于x射线反射镜、多层光学、通道切割晶体单色器(CCM)和光栅来说,高度要求原子精度、超光滑和无损伤的表面。具有数nm图形误差的超精密光学器件对于单纳米空间分辨率、信号强度和对比度至关重要。此外,亚埃的均方根表面粗糙度有利于高反射率和最低的不必要散射。此外,对于CCM和光栅基板来说,一个没有改变层的无损伤表面是非常需要的,因为它对于CCM的高反射率和光栅的均匀刻蚀率至关重要。在x射线反射镜的制造中,为了获得理想的图形误差,通常采用离子束加工(IBF)、等离子体化学汽化加工(PCVM)或弹性发射加工(EEM)等非接触加工方法,因为它们具有较高的可控性和稳定性。EEM在实现低图形误差和保持良好的表面粗糙度方面证明了最佳性能。在成形/图形化后,通常采用精加工方法来改善其表面粗糙度,而不会扭曲其图形误差。近年来,催化参考蚀刻(CARE)作为一种精加工方法已经意识到它在x射线反射镜制造中的潜力和适用性。由于其去除机制,获得了均方根RMS为0.03 nm的高度有序表面。在CCM的抛光中,由于通常采用机械方法对其表面的窄间隙进行抛光,因此残余的机械损伤导致了低反射率和低空间分辨率。最近提出了带线电极的PCVM,并证明了其优异的性能。利用PCVM技术成功实现了间隙小于100µm的CCM表面无损伤。本文介绍和讨论了近年来在成形(EEM)、表面处理(CARE)和损伤去除(PCVM)方面取得的进展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Photon-photon scattering in Born-Infeld electrodynamics SwissFEL KB-optics at-wavelength wavefront characterisation Evolutionary optimization and long-term stabilization of a multi-stage OPCPA system ZnO nanowires-based piezoelectric energy transducers: the role of size and semiconducting properties Performance simulation of a diamond channel cut monochromator operating under high-heat load at the European X-Ray Free-Electron Laser Facility
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1