Strain engineered In/sub x/Ga/sub 1-x/As channel pHEMTs on virtual substrates: a simulation study

S. Babiker, A. Asenov, S. Roy, J. Barker, S. Beaumont
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引用次数: 2

Abstract

The impact of In/sub x/Al/sub 1-x/As strain control buffers on the performance of low In content InGaAs channel pseudomorphic high electron mobility transistor p(HEMT) is investigated. It is shown that relaxed and tensile strained channel devices outperform the conventional compressively strained channel devices. It is argued that strain engineering in GaAs based devices makes it possible to realise RF characteristics comparable to InP based pHEMTs while obtaining improved breakdown characteristics.
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应变工程In/sub x/Ga/sub 1-x/As通道虚拟基板上的phemt:仿真研究
研究了In/sub x/Al/sub 1-x/As应变控制缓冲对低In含量InGaAs通道伪晶高电子迁移率晶体管p(HEMT)性能的影响。结果表明,松弛应变和拉伸应变通道装置优于传统的压缩应变通道装置。本文认为,基于GaAs的器件中的应变工程使得实现与基于InP的phemt相当的射频特性成为可能,同时获得改进的击穿特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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