R. Sharda, R. Jeffery, M. Martyniuk, R. Woodward, J. Dell, L. Faraone
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Abstract
Oxygen plasma annealing was used to crystallise (BiDy)3(FeGa)5O12 (Bi:DyIG) at a temperature of 515°C, which is over 100°C lower compared with conventional thermal annealing. We used a thermal imager to measure and characterise the temperature of the sample with respect to RF power and pressure inside a plasma chamber.
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