首页 > 最新文献

COMMAD 2012最新文献

英文 中文
Quantum integrated photonics on GaAs GaAs上的量子集成光子学
Pub Date : 2013-11-07 DOI: 10.1109/IPCON.2013.6656393
S. Hofling, M. Lermer, J. Beetz, T. Hoang, J. P. Sprengers, A. Gaggero, D. Sahin, L. Midolo, M. Skacel, L. Balet, P. Jiang, S. Jahanmirinejad, G. Frucci, N. Chauvin, F. Mattioli, R. Sanjinés, R. Leoni, E. Engin, M. Thompson, J. O'Brien, A. Fiore, M. Kamp
Progress towards the development of a quantum integrated photonics platform on GaAs will be reported, including on-chip single photon sources, detectors, splitters, couplers and modulators.
将报告GaAs上量子集成光子学平台的发展进展,包括片上单光子源、探测器、分离器、耦合器和调制器。
{"title":"Quantum integrated photonics on GaAs","authors":"S. Hofling, M. Lermer, J. Beetz, T. Hoang, J. P. Sprengers, A. Gaggero, D. Sahin, L. Midolo, M. Skacel, L. Balet, P. Jiang, S. Jahanmirinejad, G. Frucci, N. Chauvin, F. Mattioli, R. Sanjinés, R. Leoni, E. Engin, M. Thompson, J. O'Brien, A. Fiore, M. Kamp","doi":"10.1109/IPCON.2013.6656393","DOIUrl":"https://doi.org/10.1109/IPCON.2013.6656393","url":null,"abstract":"Progress towards the development of a quantum integrated photonics platform on GaAs will be reported, including on-chip single photon sources, detectors, splitters, couplers and modulators.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2013-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131112104","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Droplet epitaxy of strain-free GaAs/AlGaAs quantum molecules for optoelectronic applications 光电子应用中无应变GaAs/AlGaAs量子分子的液滴外延
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472356
W. Lei, P. Parkinson, H. Tan, C. Jagadish
This work presents a pioneering study on the MOCVD droplet epitaxy of strain-free GaAs/Al0.3Ga0.7As quantum molecules. By choosing the appropriate growth conditions, GaAs quantum molecules can be obtained with controlled size and density. The formation of these molecules is mainly due to the anisotropic migration of Ga adatoms and the edge enhanced crystallization process. Furthermore, these molecules show excellent optical properties, suggesting their promising applications in devices such as infrared photodetectors and quantum information processing.
本文对无应变GaAs/Al0.3Ga0.7As量子分子的MOCVD液滴外延进行了开创性的研究。通过选择合适的生长条件,可以获得尺寸和密度可控的砷化镓量子分子。这些分子的形成主要是由于镓原子的各向异性迁移和边缘增强的结晶过程。此外,这些分子表现出优异的光学性质,表明它们在红外光电探测器和量子信息处理等设备中有很好的应用前景。
{"title":"Droplet epitaxy of strain-free GaAs/AlGaAs quantum molecules for optoelectronic applications","authors":"W. Lei, P. Parkinson, H. Tan, C. Jagadish","doi":"10.1109/COMMAD.2012.6472356","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472356","url":null,"abstract":"This work presents a pioneering study on the MOCVD droplet epitaxy of strain-free GaAs/Al0.3Ga0.7As quantum molecules. By choosing the appropriate growth conditions, GaAs quantum molecules can be obtained with controlled size and density. The formation of these molecules is mainly due to the anisotropic migration of Ga adatoms and the edge enhanced crystallization process. Furthermore, these molecules show excellent optical properties, suggesting their promising applications in devices such as infrared photodetectors and quantum information processing.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125909333","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Light trapping and solar energy harvesting in thin film photonic crystals 薄膜光子晶体中的光捕获和太阳能收集
Pub Date : 2012-12-01 DOI: 10.1117/12.2061129
S. John
Photonic crystals are widely known for their light-trapping capabilities. This is often associated with the occurrence of a photonic band gap or other suppression in the electromagnetic density of states [1-3]. This also enables unprecedented forms of strong coupling between light and matter. A less studied form of light-trapping occurs in the higher bands of a photonic crystal, where the electromagnetic density of states is enhanced rather than suppressed. This enables strong absorption of light from a broadband source over a wide acceptance angle in a material with weak intrinsic absorption [4].
光子晶体因其捕光能力而广为人知。这通常与在态的电磁密度中出现光子带隙或其他抑制有关[1-3]。这也使得光与物质之间形成了前所未有的强耦合形式。一种较少研究的光捕获形式发生在光子晶体的高波段,在那里状态的电磁密度被增强而不是被抑制。这使得本征吸收较弱的材料能够在宽接受角上从宽带光源强吸收光[4]。
{"title":"Light trapping and solar energy harvesting in thin film photonic crystals","authors":"S. John","doi":"10.1117/12.2061129","DOIUrl":"https://doi.org/10.1117/12.2061129","url":null,"abstract":"Photonic crystals are widely known for their light-trapping capabilities. This is often associated with the occurrence of a photonic band gap or other suppression in the electromagnetic density of states [1-3]. This also enables unprecedented forms of strong coupling between light and matter. A less studied form of light-trapping occurs in the higher bands of a photonic crystal, where the electromagnetic density of states is enhanced rather than suppressed. This enables strong absorption of light from a broadband source over a wide acceptance angle in a material with weak intrinsic absorption [4].","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"16 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122343869","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Resistive switching in high-k dielectrics for non-volatile memory applications 非易失性存储器用高k介电体的电阻开关
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472390
R. Elliman, M. Saleh, D. Venkatachalam, T. Kim, K. Belay, F. Karouta
We review our recent research on resistive switching in transition metal oxides for use as nonvolatile resistive random access memory (ReRAM), including the effect of film microstructure on switching characteristics and new data on metal-bridge memory.
本文综述了近年来用于非易失性电阻随机存取存储器(ReRAM)的过渡金属氧化物中电阻开关的研究进展,包括薄膜微观结构对开关特性的影响以及金属桥式存储器的新研究成果。
{"title":"Resistive switching in high-k dielectrics for non-volatile memory applications","authors":"R. Elliman, M. Saleh, D. Venkatachalam, T. Kim, K. Belay, F. Karouta","doi":"10.1109/COMMAD.2012.6472390","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472390","url":null,"abstract":"We review our recent research on resistive switching in transition metal oxides for use as nonvolatile resistive random access memory (ReRAM), including the effect of film microstructure on switching characteristics and new data on metal-bridge memory.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"104 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122628597","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Fabrication of single photon centres in silicon carbide 碳化硅中单光子中心的制备
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472438
B. C. Johnson, S. Castelletto, T. Ohshima, T. Umeda
Bright room temperature single photon emission from isolated defects in bulk 4H silicon carbide (SiC) is reported. The photo-physical properties of the defect, having emission around 700 nm is presented.
报道了块状4H碳化硅(SiC)中孤立缺陷的明亮室温单光子发射。给出了该缺陷在700 nm左右发射的光物理性质。
{"title":"Fabrication of single photon centres in silicon carbide","authors":"B. C. Johnson, S. Castelletto, T. Ohshima, T. Umeda","doi":"10.1109/COMMAD.2012.6472438","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472438","url":null,"abstract":"Bright room temperature single photon emission from isolated defects in bulk 4H silicon carbide (SiC) is reported. The photo-physical properties of the defect, having emission around 700 nm is presented.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"02 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129009101","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
A metamaterial antenna approach to near infra-red polarisation state control 近红外偏振状态控制的超材料天线方法
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472361
J. Cadusch, T. James, T. Davis, A. Roberts
We report on a plasmonic metamaterial approach to controlling the polarisation state of visible and near infra-red (NIR) light.
我们报告了一种等离子体超材料方法来控制可见光和近红外光的偏振状态。
{"title":"A metamaterial antenna approach to near infra-red polarisation state control","authors":"J. Cadusch, T. James, T. Davis, A. Roberts","doi":"10.1109/COMMAD.2012.6472361","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472361","url":null,"abstract":"We report on a plasmonic metamaterial approach to controlling the polarisation state of visible and near infra-red (NIR) light.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114212144","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of plasmonic nanoparticles on the quantum efficiency of III–V semiconductor nanowire emitters 等离子体纳米粒子对III-V型半导体纳米线发射体量子效率的影响
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472353
S. Mokkapati, D. Saxena, Q. Gao, H. Tan, C. Jagadish
We study the possibility of increasing the quantum efficiency of III-V semiconductor nanowire emitters using plasmonics. Results on the effect of plasmonic nanoparticle size, emitter-plasmonic nanoparticle distance and the initial quantum efficiency of the emitter on the quantum efficiency enhancement factor are presented.
我们研究了利用等离子体提高III-V型半导体纳米线发射体量子效率的可能性。给出了等离子体纳米粒子尺寸、发射体-等离子体纳米粒子距离和发射体初始量子效率对量子效率增强因子的影响。
{"title":"Effect of plasmonic nanoparticles on the quantum efficiency of III–V semiconductor nanowire emitters","authors":"S. Mokkapati, D. Saxena, Q. Gao, H. Tan, C. Jagadish","doi":"10.1109/COMMAD.2012.6472353","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472353","url":null,"abstract":"We study the possibility of increasing the quantum efficiency of III-V semiconductor nanowire emitters using plasmonics. Results on the effect of plasmonic nanoparticle size, emitter-plasmonic nanoparticle distance and the initial quantum efficiency of the emitter on the quantum efficiency enhancement factor are presented.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114823578","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Monolithically integrated multi-section semiconductor laser by selective area quantum well intermixing 选择性区域量子阱混合的单片集成多段半导体激光器
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472398
P. Sajewicz, L. Fu, H. Tan, K. Vora, C. Jagadish
In this work, we report the use of dielectric capping layer of TiO2 to selectively suppress thermal interdiffusion of an InGaAs/GaAs quantum well laser structure. Large differential wavelength shift of ~ 25nm has been obtained across the same wafer between the uncapped and capped regions which is promising for achieving monolithic integration of multi-section semiconductor laser consisting of a gain, a phase and a passive waveguide sections.
在这项工作中,我们报道了使用TiO2的介电封盖层来选择性地抑制InGaAs/GaAs量子阱激光结构的热互扩散。在同一晶圆上,在非封顶和封顶区域之间获得了~ 25nm的大差分波长位移,这有望实现由增益、相位和无源波导部分组成的多段半导体激光器的单片集成。
{"title":"Monolithically integrated multi-section semiconductor laser by selective area quantum well intermixing","authors":"P. Sajewicz, L. Fu, H. Tan, K. Vora, C. Jagadish","doi":"10.1109/COMMAD.2012.6472398","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472398","url":null,"abstract":"In this work, we report the use of dielectric capping layer of TiO2 to selectively suppress thermal interdiffusion of an InGaAs/GaAs quantum well laser structure. Large differential wavelength shift of ~ 25nm has been obtained across the same wafer between the uncapped and capped regions which is promising for achieving monolithic integration of multi-section semiconductor laser consisting of a gain, a phase and a passive waveguide sections.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127977081","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Optical switching and photoluminescence in erbium implanted vanadium dioxide thin films 掺铒二氧化钒薄膜的光开关和光致发光
Pub Date : 2012-12-01 DOI: 10.1557/OPL.2013.544
H. Lim, J. McCallum, N. Stavrias, R. Marvel, R. Haglund
Vanadium dioxide (VO2) undergoes an insulator-metal transition (IMT) that involves drastic changes in its electrical and optical properties at relatively low critical temperature Tc ≈ 67°C [1]. The switching speed when triggered by an optical impulse is incredibly fast, within a femtosecond timescale [2]. Erbium (Er3+) with a stimulated emission at the standard telecommunication wave-length of 1535nm has been used extensively in fiber-optic communication systems [3]. The combination of VO2 and Er3+ could make an ultrafast optical switch that is capable of simultaneous signal amplification. In this work, we investigated the possibilities of making such a device, both theoretically and experimentally. Our experimental methods involve temperature-driven optical switching tests and photoluminescence (PL) spectroscopy on Er3+ implanted VO2 thin films. The observations of the IMT of VO2 and the PL of Er3+ in the thin films would be vital in determining whether the VO2:Er system would work as an optical switch and amplifier. A range of implantation and post-annealing schemes were explored in an attempt to find the optimal processing conditions that would maximize the qualities of the optical switching and PL.
二氧化钒(VO2)在相对较低的临界温度Tc≈67°C[1]下发生绝缘体-金属转变(IMT),其电学和光学性质发生剧烈变化。当由光脉冲触发时,开关速度非常快,在飞秒的时间尺度内。铒(Er3+)在标准电信波长1535nm处具有受激辐射,已广泛应用于光纤通信系统[3]。VO2和Er3+的结合可以制造出能够同时放大信号的超快光开关。在这项工作中,我们从理论上和实验上研究了制造这种装置的可能性。我们的实验方法包括温度驱动的光开关测试和Er3+植入VO2薄膜的光致发光(PL)光谱。观察薄膜中VO2的IMT和Er3+的PL对于确定VO2:Er系统是否可以作为光开关和放大器至关重要。研究了一系列的注入和后退火方案,试图找到最佳的加工条件,以最大限度地提高光开关和PL的质量。
{"title":"Optical switching and photoluminescence in erbium implanted vanadium dioxide thin films","authors":"H. Lim, J. McCallum, N. Stavrias, R. Marvel, R. Haglund","doi":"10.1557/OPL.2013.544","DOIUrl":"https://doi.org/10.1557/OPL.2013.544","url":null,"abstract":"Vanadium dioxide (VO2) undergoes an insulator-metal transition (IMT) that involves drastic changes in its electrical and optical properties at relatively low critical temperature Tc ≈ 67°C [1]. The switching speed when triggered by an optical impulse is incredibly fast, within a femtosecond timescale [2]. Erbium (Er3+) with a stimulated emission at the standard telecommunication wave-length of 1535nm has been used extensively in fiber-optic communication systems [3]. The combination of VO2 and Er3+ could make an ultrafast optical switch that is capable of simultaneous signal amplification. In this work, we investigated the possibilities of making such a device, both theoretically and experimentally. Our experimental methods involve temperature-driven optical switching tests and photoluminescence (PL) spectroscopy on Er3+ implanted VO2 thin films. The observations of the IMT of VO2 and the PL of Er3+ in the thin films would be vital in determining whether the VO2:Er system would work as an optical switch and amplifier. A range of implantation and post-annealing schemes were explored in an attempt to find the optimal processing conditions that would maximize the qualities of the optical switching and PL.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"30 11","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131539290","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 20
Low-band gap nanoparticles embedded in high-K dielectrics 嵌入高k介电体中的低带隙纳米颗粒
Pub Date : 2012-12-01 DOI: 10.1109/COMMAD.2012.6472391
T. Nestler, S. Haas, R. Otto, F. Schneider, S. Hickey, S. Gabriel, C. Himcinschi, V. Klemm, G. Schreiber, J. Heitmann
In this paper our recent research on Ge and PbS nanoparticles embedded in ZrO2 will be reviewed. Ge nanoparticles have been deposited by rf-cosputtering of ZrGe2O2.9/ZrO2 superlattices and subsequent annealing. ZrO2 and the phase separated Ge crystallizes at 650°C into nanocrystalline layers. These layers show a luminescence signal at 2.5 eV, which is contributed to defect luminescence. PbS nanoparticles have been fabricated using wet chemical methods and embedded in the ZrO2 matrix by sol-gel deposition. In this case a luminescence signal at 1.3 μm has been detected after annealing at 100°C.
本文综述了近年来在ZrO2中嵌入锗和PbS纳米颗粒的研究进展。通过对ZrGe2O2.9/ZrO2超晶格进行rf共溅射和退火,制备了锗纳米粒子。ZrO2和相分离的Ge在650℃下结晶成纳米晶层。这些层在2.5 eV时显示出发光信号,这是缺陷发光的原因。采用湿化学方法制备了PbS纳米颗粒,并采用溶胶-凝胶沉积法将其嵌入ZrO2基质中。在这种情况下,在100℃退火后,在1.3 μm处检测到发光信号。
{"title":"Low-band gap nanoparticles embedded in high-K dielectrics","authors":"T. Nestler, S. Haas, R. Otto, F. Schneider, S. Hickey, S. Gabriel, C. Himcinschi, V. Klemm, G. Schreiber, J. Heitmann","doi":"10.1109/COMMAD.2012.6472391","DOIUrl":"https://doi.org/10.1109/COMMAD.2012.6472391","url":null,"abstract":"In this paper our recent research on Ge and PbS nanoparticles embedded in ZrO<sub>2</sub> will be reviewed. Ge nanoparticles have been deposited by rf-cosputtering of ZrGe<sub>2</sub>O<sub>2.9</sub>/ZrO<sub>2</sub> superlattices and subsequent annealing. ZrO<sub>2</sub> and the phase separated Ge crystallizes at 650°C into nanocrystalline layers. These layers show a luminescence signal at 2.5 eV, which is contributed to defect luminescence. PbS nanoparticles have been fabricated using wet chemical methods and embedded in the ZrO<sub>2</sub> matrix by sol-gel deposition. In this case a luminescence signal at 1.3 μm has been detected after annealing at 100°C.","PeriodicalId":136573,"journal":{"name":"COMMAD 2012","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130701528","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
期刊
COMMAD 2012
全部 Acc. Chem. Res. ACS Applied Bio Materials ACS Appl. Electron. Mater. ACS Appl. Energy Mater. ACS Appl. Mater. Interfaces ACS Appl. Nano Mater. ACS Appl. Polym. Mater. ACS BIOMATER-SCI ENG ACS Catal. ACS Cent. Sci. ACS Chem. Biol. ACS Chemical Health & Safety ACS Chem. Neurosci. ACS Comb. Sci. ACS Earth Space Chem. ACS Energy Lett. ACS Infect. Dis. ACS Macro Lett. ACS Mater. Lett. ACS Med. Chem. Lett. ACS Nano ACS Omega ACS Photonics ACS Sens. ACS Sustainable Chem. Eng. ACS Synth. Biol. Anal. Chem. BIOCHEMISTRY-US Bioconjugate Chem. BIOMACROMOLECULES Chem. Res. Toxicol. Chem. Rev. Chem. Mater. CRYST GROWTH DES ENERG FUEL Environ. Sci. Technol. Environ. Sci. Technol. Lett. Eur. J. Inorg. Chem. IND ENG CHEM RES Inorg. Chem. J. Agric. Food. Chem. J. Chem. Eng. Data J. Chem. Educ. J. Chem. Inf. Model. J. Chem. Theory Comput. J. Med. Chem. J. Nat. Prod. J PROTEOME RES J. Am. Chem. Soc. LANGMUIR MACROMOLECULES Mol. Pharmaceutics Nano Lett. Org. Lett. ORG PROCESS RES DEV ORGANOMETALLICS J. Org. Chem. J. Phys. Chem. J. Phys. Chem. A J. Phys. Chem. B J. Phys. Chem. C J. Phys. Chem. Lett. Analyst Anal. Methods Biomater. Sci. Catal. Sci. Technol. Chem. Commun. Chem. Soc. Rev. CHEM EDUC RES PRACT CRYSTENGCOMM Dalton Trans. Energy Environ. Sci. ENVIRON SCI-NANO ENVIRON SCI-PROC IMP ENVIRON SCI-WAT RES Faraday Discuss. Food Funct. Green Chem. Inorg. Chem. Front. Integr. Biol. J. Anal. At. Spectrom. J. Mater. Chem. A J. Mater. Chem. B J. Mater. Chem. C Lab Chip Mater. Chem. Front. Mater. Horiz. MEDCHEMCOMM Metallomics Mol. Biosyst. Mol. Syst. Des. Eng. Nanoscale Nanoscale Horiz. Nat. Prod. Rep. New J. Chem. Org. Biomol. Chem. Org. Chem. Front. PHOTOCH PHOTOBIO SCI PCCP Polym. Chem.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1