Demonstration of a 3-D GaAs HEMT Phase Shifter MMIC Utilizing a Five Layer BCB Process with Seven Metal Layers

D. Farkas, J. Uyeda, J. Wang, W. Luo, R. Elmadjian, D. Eaves, K. Luo, R. Lai, M. Barsky, M. Wojtowicz, A. Oki
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引用次数: 1

Abstract

In this paper, we demonstrate a vertically integrated 3-D MMIC phase shifter at 8 GHz that utilizes a 5-layer benzocyclobutene (BCB) process providing a total of 7 metal layers. This multi-layer technology is fully compatible with Northrop Grumman's 0.15 um GaAs HEMT technology and enables a high level of MMIC compaction which will substantially reduce the size and cost of MMICs. A key feature of this technology is the ability to isolate vertically integrated components of a MMIC' with separate ground planes allowing circuit compaction while maintaining high isolation.
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利用七金属层五层BCB工艺的三维GaAs HEMT移相器MMIC的演示
在本文中,我们展示了一种垂直集成的3d MMIC移相器,该移相器采用5层苯并环丁烯(BCB)工艺,共提供7层金属层。这种多层技术与诺斯罗普·格鲁曼公司的0.15微米GaAs HEMT技术完全兼容,可以实现高水平的MMIC压缩,这将大大减少MMIC的尺寸和成本。该技术的一个关键特点是能够将MMIC的垂直集成组件与单独的接地面隔离开来,从而在保持高隔离的同时实现电路压缩。
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