Investigation of voltage-dependent thermal property in high-voltage drain-extended MOSFETs

Chen-Liang Chu, C. M. Hu, C. F. Huang, Y. Chen, F. Y. Chen, K. Thei, C. Hsu, C. Yao, R. Liou, H. Tuan
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Abstract

In this study, a reduction in the saturation current caused by self-heating effect at high VGS is observed in a 35-V rated asymmetric DEMOSFET. The high VGS -induced the large current and raises up the device surface temperature. The Kirk-effect takes places at sufficiently high current levels (high VGS values) leading to the movement of the maximum temperature point from the gate-overlapped DE (drain-extended) region to the drain-side contact region. The drift-region resistance strongly correlates to the self-heating effect and the VK voltage is proportional to the doping concentration in the drift region. As a result, the reduced surface heating (RESURH) can be realized by the optimization of doping concentration in the drift region.
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高压漏极扩展mosfet的电压相关热特性研究
在本研究中,在35 v额定的非对称demofet中观察到高VGS下由自热效应引起的饱和电流的降低。高VGS诱发大电流,使器件表面温度升高。柯克效应发生在足够高的电流水平(高VGS值),导致最高温度点从栅极重叠DE(漏极扩展)区域移动到漏极侧接触区域。漂移区电阻与自热效应密切相关,VK电压与漂移区掺杂浓度成正比。因此,可以通过优化漂移区掺杂浓度来实现表面减热(RESURH)。
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