Chen-Liang Chu, C. M. Hu, C. F. Huang, Y. Chen, F. Y. Chen, K. Thei, C. Hsu, C. Yao, R. Liou, H. Tuan
{"title":"Investigation of voltage-dependent thermal property in high-voltage drain-extended MOSFETs","authors":"Chen-Liang Chu, C. M. Hu, C. F. Huang, Y. Chen, F. Y. Chen, K. Thei, C. Hsu, C. Yao, R. Liou, H. Tuan","doi":"10.1109/ISPSD.2012.6229037","DOIUrl":null,"url":null,"abstract":"In this study, a reduction in the saturation current caused by self-heating effect at high VGS is observed in a 35-V rated asymmetric DEMOSFET. The high VGS -induced the large current and raises up the device surface temperature. The Kirk-effect takes places at sufficiently high current levels (high VGS values) leading to the movement of the maximum temperature point from the gate-overlapped DE (drain-extended) region to the drain-side contact region. The drift-region resistance strongly correlates to the self-heating effect and the VK voltage is proportional to the doping concentration in the drift region. As a result, the reduced surface heating (RESURH) can be realized by the optimization of doping concentration in the drift region.","PeriodicalId":371298,"journal":{"name":"2012 24th International Symposium on Power Semiconductor Devices and ICs","volume":"111 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-06-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 24th International Symposium on Power Semiconductor Devices and ICs","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2012.6229037","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this study, a reduction in the saturation current caused by self-heating effect at high VGS is observed in a 35-V rated asymmetric DEMOSFET. The high VGS -induced the large current and raises up the device surface temperature. The Kirk-effect takes places at sufficiently high current levels (high VGS values) leading to the movement of the maximum temperature point from the gate-overlapped DE (drain-extended) region to the drain-side contact region. The drift-region resistance strongly correlates to the self-heating effect and the VK voltage is proportional to the doping concentration in the drift region. As a result, the reduced surface heating (RESURH) can be realized by the optimization of doping concentration in the drift region.