A study on hot-carrier-induced photoemission in n-MOSFETs under dynamic operation

T. Ohzone, M. Yuzaki, T. Matsuda, E. Kameda
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引用次数: 8

Abstract

Two dimensional photoemission profiles from n-MOSFETs supplying various pulse waveforms to the gate were measured and analyzed by a photoemission microscope. TPC (Total Photon Counts) were proportional to average drain and substrate currents under dynamic operation as observed under DC operation. TPC profiles of wide channel width MOSFETs, however, varied along the channel width direction under dynamic operation. It suggests that the substrate current distribution fluctuates along the channel width direction and affects the device lifetime.
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动态工作下n- mosfet热载子诱导光发射的研究
利用光电显微镜测量和分析了n- mosfet为栅极提供不同脉冲波形的二维光电发射曲线。在直流工作下观察到,动态工作下的TPC(总光子计数)与平均漏极和衬底电流成正比。而在动态工作下,宽沟道宽度mosfet的TPC分布沿沟道宽度方向变化。结果表明,衬底电流分布沿沟道宽度方向波动,影响器件寿命。
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