Quantified Impacts of Guardband Reduction on Design Process Outcomes

Kwangok Jeong, A. Kahng, K. Samadi
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引用次数: 22

Abstract

The value of guardband reduction is a critical open issue for the semiconductor industry. For example, due to competitive pressure, foundries have started to incent the design of manufacturing-friendly ICs through reduced model guardbands when designers adopt layout restrictions. The industry also continuously weighs the economic viability of relaxing process variation limits in the technology roadmap [2]. Our work gives the first-ever quantification of the impact of modeling guardband reduction on outcomes from the synthesis, place and route (SP&R) implementation flow. We assess the impact of model guard- band reduction on various metrics of design cycle time and design quality, using open-source cores and production (specifically, ARM/TSMC) 90 nm and 65 nm technologies and libraries. Our experimental data clearly shows the potential design quality and turnaround time benefits of model guardband reduction. For example, we typically (i.e., on average) observe 13% standard-cell area reduction and 12% routed wirelength reduction as the consequence of a 40% reduction in library model guardband; 40% is the amount of guardband reduction reported by IBM for a variation-aware timing methodology [8]. We also assess the impact of guardband reduction on design yield. Our results suggest that there is justification for the design, EDA and process communities to enable guardband reduction as an economic incentive for manufacturing-friendly design practices.
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减少防护带对设计过程结果的量化影响
对于半导体行业来说,减少守卫带的价值是一个关键的开放性问题。例如,由于竞争压力,当设计人员采用布局限制时,代工厂已开始通过减少模型保护带来激励制造友好型ic的设计。该行业还不断权衡放宽技术路线图中工艺变化限制的经济可行性。我们的工作首次量化了建模保护带减少对合成、位置和路径(SP&R)实施流程结果的影响。我们评估了模型保护带减少对设计周期时间和设计质量的各种指标的影响,使用开源内核和生产(特别是ARM/TSMC) 90纳米和65纳米技术和库。我们的实验数据清楚地显示了模型保护带减少的潜在设计质量和周转时间的好处。例如,我们通常(即平均)观察到,由于库模型保护带减少了40%,标准单元面积减少了13%,路由长度减少了12%;40%是IBM报告的可变感知时序方法[8]的保护带减少量。我们还评估了保护带减少对设计良率的影响。我们的研究结果表明,设计、EDA和工艺社区有理由将减少保护带作为制造友好型设计实践的经济激励。
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