Study of Annealing Effect on Characteristics of NiFeW Alloy Thin Films

Hovan George A. S.
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Abstract

Alloy thin films of NiFeW were prepared using electroplating at room temperature. Then electroplated NiFeW thin films was annealed at 200 o C. NiFeW deposited films are textured with FCC phase preferred orientation. They were exposed to morphological, structural and mechanical characterization analysis. NiFeW films were bright and uniformly coated on the surface. Also the deposits of NiFeW films were in nano scale and the average crystalline size was around 70 nm. The micro hardness of NiFeW was 142 VHN after annealing.
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退火对镍铁合金薄膜特性影响的研究
采用室温电镀法制备了镍铁合金薄膜。然后在200℃下对电镀镍铁薄膜进行退火处理,制备出FCC相择优取向的镍铁薄膜。对其进行了形态、结构和力学表征分析。镀层光亮均匀。镍铁薄膜的沉积在纳米尺度上,平均晶粒尺寸在70 nm左右。退火后的镍铁显微硬度为142 VHN。
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