{"title":"Evaluation of high-voltage GAN transistor in 3-phase PFC circuit","authors":"M. Frivaldský, M. Pipíška","doi":"10.1109/EDPE53134.2021.9604046","DOIUrl":null,"url":null,"abstract":"The aim of this paper is evaluation of new 1200 V GaN power transistor technology within selected target application circuit. As a evaluating circuit, 3-phase PFC in dual interleaved topology was selected. Consequently, identification of commercially available 1200 V GaN structure was realized. Selected transistor was implemented withing PFC circuit and evaluated. Testing under nominal operational parameters revealed that developed 1200 V GaN power transistor has lack of performance to reliably operate at industrial application due to missed optimization and testing during development phase. Asa a result it was concluded that 1200 V GaN technology still requires additional research and development time to successfully compete robust SiC transistor structures.","PeriodicalId":117091,"journal":{"name":"2021 International Conference on Electrical Drives & Power Electronics (EDPE)","volume":"21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-09-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 International Conference on Electrical Drives & Power Electronics (EDPE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDPE53134.2021.9604046","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The aim of this paper is evaluation of new 1200 V GaN power transistor technology within selected target application circuit. As a evaluating circuit, 3-phase PFC in dual interleaved topology was selected. Consequently, identification of commercially available 1200 V GaN structure was realized. Selected transistor was implemented withing PFC circuit and evaluated. Testing under nominal operational parameters revealed that developed 1200 V GaN power transistor has lack of performance to reliably operate at industrial application due to missed optimization and testing during development phase. Asa a result it was concluded that 1200 V GaN technology still requires additional research and development time to successfully compete robust SiC transistor structures.
本文的目的是在选定的目标应用电路中对新的1200v GaN功率晶体管技术进行评价。作为评估电路,我们选择了双交错拓扑的三相PFC。从而实现了商用1200v GaN结构的识别。选定晶体管在PFC电路中实现并进行了评估。在标称工作参数下的测试表明,由于在开发阶段错过了优化和测试,所开发的1200 V GaN功率晶体管在工业应用中缺乏可靠的性能。因此,得出的结论是,1200 V GaN技术仍然需要额外的研究和开发时间才能成功地与强大的SiC晶体管结构竞争。