The effect of photonic correction on the optical and photoelectric characteristics of the In4Se3, In4Тe3 and GaP epitaxial structures

M. O. Sorokatyi, V. Pylypko, V. Strebezhev, I. Yuriychuk, V. Strebezhev, V. M. Lipka, Y. Dobrovolsky
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Abstract

Optimizing effect of pulsed laser radiation on the structure of the In4Se3 and In4Тe3 epitaxial layers obtained by liquid phase epitaxy was studied by SEM, AFM, and EDS techniques. Ordered quasi-periodic micro- and nanostructures were created on the samples by laser melting. When studying the transverse chips of the structures based on the In4Se3, it was found that laser treatment leads to the formation of both narrow band gap and wide band gap phases of the In – Se system in the epitaxial layer. The action of laser treatment leads to the inversion of the conductivity type and to the formation of the laser photosensitive surface-barrier structures, reduces the influence of recombination processes on the heteroboundary. Optical studies have shown the efficiency of controlled laser action on the structural-phase state of the In4Se3 and In4Тe3 layers and improving their optical characteristics and photosensitivity. An increase in the sensitivity of the FTO-GaP diode structure at the wavelength 254 nm, as well as in the entire spectral range is observed with the laser treatment action
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光子校正对In4Se3、In4Тe3和GaP外延结构光学和光电特性的影响
利用扫描电镜(SEM)、原子力显微镜(AFM)和能谱分析仪(EDS)研究了脉冲激光辐射对液相外延制备的In4Se3和In4Тe3外延层结构的优化效果。通过激光熔化在样品上形成了有序的准周期微纳米结构。在研究基于In4Se3结构的横向芯片时,发现激光处理导致外延层中In - Se体系的窄带隙和宽带隙相的形成。激光处理的作用导致了电导率类型的反转和激光光敏表面势垒结构的形成,减少了复合过程对异质边界的影响。光学研究表明,可控激光作用对In4Se3和In4Тe3层的结构相态有有效的影响,并改善了它们的光学特性和光敏性。在激光处理作用下,FTO-GaP二极管结构在254 nm波长及整个光谱范围内的灵敏度均有提高
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