Robust 60 GHz 90nm and 40nm CMOS wideband neutralized amplifiers with 23dB gain 4.6dB NF and 24% PAE

E. Cohen, O. Degani, S. Ravid, D. Ritter
{"title":"Robust 60 GHz 90nm and 40nm CMOS wideband neutralized amplifiers with 23dB gain 4.6dB NF and 24% PAE","authors":"E. Cohen, O. Degani, S. Ravid, D. Ritter","doi":"10.1109/SIRF.2012.6160151","DOIUrl":null,"url":null,"abstract":"A three stage transformer differential cross coupled (CC) LNA and PA with integrated baluns for operation in the 57-66GHz band are presented. The LNA fabricated in a 90nm CMOS process achieves 23dB gain and 4.6dB NF at 13mA and 1.3V supply, with 0.06mm2 in size. The PA, also fabricated in a 90nm CMOS process, has maximum power added efficiency (PAE) of 19.4%, 9.4dBm Psat, and 23dB gain with a 12GHz BW and 0.05mm2 chip size. A 2 stage PA fabricated in a digital 40nm CMOS achieves 19dB gain and a record PAE of 24%. The paper analyzes the advantages of MOScap neutralization feedback compared to metal capacitors and low k transformers for process stability and broadband design. Tuning is added to the CC feedback to compensate for process variations.","PeriodicalId":339730,"journal":{"name":"2012 IEEE 12th Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"18","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE 12th Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SIRF.2012.6160151","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 18

Abstract

A three stage transformer differential cross coupled (CC) LNA and PA with integrated baluns for operation in the 57-66GHz band are presented. The LNA fabricated in a 90nm CMOS process achieves 23dB gain and 4.6dB NF at 13mA and 1.3V supply, with 0.06mm2 in size. The PA, also fabricated in a 90nm CMOS process, has maximum power added efficiency (PAE) of 19.4%, 9.4dBm Psat, and 23dB gain with a 12GHz BW and 0.05mm2 chip size. A 2 stage PA fabricated in a digital 40nm CMOS achieves 19dB gain and a record PAE of 24%. The paper analyzes the advantages of MOScap neutralization feedback compared to metal capacitors and low k transformers for process stability and broadband design. Tuning is added to the CC feedback to compensate for process variations.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
稳健的60ghz 90nm和40nm CMOS宽带中和放大器,增益为23dB, NF为4.6dB, PAE为24%
提出了一种用于57-66GHz频段的三相变压器差动交叉耦合(CC) LNA和PA集成平衡器。采用90nm CMOS工艺制造的LNA在13mA和1.3V电源下可实现23dB增益和4.6dB NF,尺寸为0.06mm2。该PA也采用90nm CMOS工艺制造,在12GHz BW和0.05mm2芯片尺寸下,最大功率增加效率(PAE)为19.4%,Psat为9.4dBm,增益为23dB。在数字40nm CMOS中制造的2级PA实现了19dB增益和创纪录的24% PAE。本文分析了MOScap中和反馈在过程稳定性和宽带设计方面相对于金属电容器和低k变压器的优势。调优被添加到CC反馈中,以补偿过程变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Highly linear robust RF switch with low insertion loss and high power handling capability in a 65nm CMOS technology A comparison of intermodulation distortion performance of HICUM and VBIC compact models for pnp SiGe HBTs on SOI A 245 GHz CB LNA and SHM mixer in SiGe technology A highly efficient 1-Watt broadband class-J SiGe power amplifier at 700MHz Tunable linear MOS resistor for RF applications
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1