Programmable set to monitor charge state change of MIS devices under high-fields

D. Andreev, G. Bondarenko, V. Andreev, Sergey A. Loskutov
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Abstract

In modern microelectronics high fields are an essential condition of devices based on metal-insulator-semiconductor (MIS) structures what is caused by downscaling of nodes of semiconductor manufacturing processes. Under these conditions, a possibility of charge degradation increases what can result in dielectric film breakdown and following integrated circuit (IC) failure. Therefore, a designing of configurable set to monitor charge state change of MIS devices under high fields is a relevant task. In order to implement this, we developed a programmable set which is based on a combined evaluation of the charge state of MIS devices being under electron injection. The set consists of a unit for injection monitoring and a unit to measure C-V curves.
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可编程设置监控高场下MIS设备的电荷状态变化
在现代微电子技术中,高场是基于金属-绝缘体-半导体(MIS)结构的器件的必要条件,这是由于半导体制造过程中节点的缩小造成的。在这些条件下,电荷衰减的可能性会增加,从而导致介电膜击穿和随后的集成电路(IC)故障。因此,设计一套可配置的装置来监测高场环境下MIS器件的电荷状态变化是一个相关的课题。为了实现这一点,我们开发了一个基于电子注入下MIS器件电荷状态综合评价的可编程集。该装置由一个注射监测单元和一个测量C-V曲线的单元组成。
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