The effect of extrinsic capacitances on the microwave performance of Ga/sub 0.51/In/sub 0.49/P/GaAs MISFETs (0 nm/spl les/t/spl les/10 nm) grown by GSMBE

Yo‐Sheng Lin, Shey-Shi Lu
{"title":"The effect of extrinsic capacitances on the microwave performance of Ga/sub 0.51/In/sub 0.49/P/GaAs MISFETs (0 nm/spl les/t/spl les/10 nm) grown by GSMBE","authors":"Yo‐Sheng Lin, Shey-Shi Lu","doi":"10.1109/SMICND.1996.557478","DOIUrl":null,"url":null,"abstract":"The effect of extrinsic capacitances on the microwave performance of Ga/sub 0.51/In/sub 0.49/P/GaAs MISFETs was first studied experimentally and theoretically by varying the thickness of the Ga/sub 0.51/In/sub 0.49/P insulating layer. MISFETs with airbridge gate structure showed higher f/sub t/s, and f/sub max/s than those of MISFETs with traditional gate structure due to the lower extrinsic capacitances. Moreover, the maximum values of f/sub t/s, and f/sub max/s for a 1 /spl mu/m gate length device all happen when t is between 50 nm and 100 nm. These results demonstrate that Ga/sub 0.51/In/sub 0.49/P/GaAs airbridge gate MISFETs with insulator thickness between 50 nm and 100 nm were very suitable for microwave high power device applications.","PeriodicalId":266178,"journal":{"name":"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-10-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 International Semiconductor Conference. 19th Edition. CAS'96 Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.1996.557478","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The effect of extrinsic capacitances on the microwave performance of Ga/sub 0.51/In/sub 0.49/P/GaAs MISFETs was first studied experimentally and theoretically by varying the thickness of the Ga/sub 0.51/In/sub 0.49/P insulating layer. MISFETs with airbridge gate structure showed higher f/sub t/s, and f/sub max/s than those of MISFETs with traditional gate structure due to the lower extrinsic capacitances. Moreover, the maximum values of f/sub t/s, and f/sub max/s for a 1 /spl mu/m gate length device all happen when t is between 50 nm and 100 nm. These results demonstrate that Ga/sub 0.51/In/sub 0.49/P/GaAs airbridge gate MISFETs with insulator thickness between 50 nm and 100 nm were very suitable for microwave high power device applications.
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外源电容对GSMBE生长的Ga/sub 0.51/In/sub 0.49/P/GaAs misfet (0 nm/spl les/t/spl les/10 nm)微波性能的影响
通过改变Ga/sub 0.51/In/sub 0.49/P/GaAs misfet绝缘层的厚度,首先从实验和理论上研究了外部电容对其微波性能的影响。由于外部电容较小,采用气桥栅极结构的misfet比传统栅极结构的misfet具有更高的f/sub t/s和f/sub max/s。对于1 /spl mu/m栅极长度器件,f/sub t/s和f/sub max/s的最大值均发生在t在50 nm ~ 100 nm之间。结果表明,绝缘体厚度在50 ~ 100 nm之间的Ga/sub 0.51/In/sub 0.49/P/GaAs气桥栅misfet非常适合用于微波高功率器件。
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